Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.47 |
| ▸ | RAB9A | P51151 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | CASP3 | P42574 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.40 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.40 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.40 |
| ▸ | CNR2 | P34972 | 2/20 | 0.39 |
| ▸ | HRH3 | Q9Y5N1 | 12/20 | 0.38 |
| ▸ | MAOB | P27338 | 8/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | SHBG | P04278 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL779443 | 0.84 | NPC1 (0.58) | NPC1RAB9AMAPTLMNAMAPK1 | |
| SCHEMBL12967599 | 0.83 | NPC1 (0.48) | NPC1RAB9AMAPTLMNAMAPK1 | |
| SCHEMBL10252651 | 0.83 | TSHR (0.46) | NPC1RAB9AMAPTLMNAMAPK1 | |
| SCHEMBL11952283 | 0.81 | NPC1 (0.52) | NPC1RAB9AMAPTLMNAMAPK1 | |
| SCHEMBL13016 | 0.80 | NPC1 (0.50) | NPC1RAB9AMAPTLMNAMAPK1 | |
| SCHEMBL200312 | 0.78 | NPC1 (0.48) | NPC1RAB9AMAPTLMNAMAPK1 | |
| Iodide SCHEMBL5175074 | 0.78 | NPC1 (0.48) | NPC1RAB9AMAPTLMNAMAPK1 | |
| SCHEMBL3625528 | 0.77 | NPC1 (0.52) | NPC1RAB9AMAPTLMNAMAPK1 | |
| SCHEMBL5552840 | 0.77 | NPC1 (0.52) | NPC1RAB9AMAPTLMNAMAPK1 | |
| SCHEMBL3292125 | 0.77 | NPC1 (0.52) | NPC1RAB9AMAPTLMNAMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210173309-A1 | METHOD OF FORMING REVERSED PATTERN AND METHOD OF MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-06-10 | — | — | US | disclosed |
| US-9760003-B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | FUJIFILM CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| EP-1199603-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-9423690-B2 | Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same | FUJIFILM CORPORATION (JP) | 2016-08-23 | — | — | US | disclosed |
| US-9250532-B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-02-02 | — | — | US | disclosed |
| US-20150168834-A1 | PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| US-20140127629-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-05-08 | — | — | US | disclosed |
| US-8709704-B2 | Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method | FUJIFILM CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |
| EP-1964894-B1 | Ink composition, inkjetrecording method, printed material, method for producing planographic printing plate, and planographic printing plate | FUJIFILM CORP (JP) | 2013-01-23 | — | — | EP | disclosed |
| US-20110183263-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| EP-1762599-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic plate, and lithographic printing plate | FUJIFILM Corporation (JP) | 2007-03-14 | — | — | EP | disclosed |