SCHEMBL124997

SCHEMBL124997

CCC(C(C)=O)C(=O)[O-].CCC(C(C)=O)C(=O)[O-].[Ti+2]

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.39
TSHR P16473 2/20 0.39
NFKB1 P19838 2/20 0.39
NPSR1 Q6W5P4 2/20 0.39
CA2 P00918 2/20 0.37
CA1 P00915 4/20 0.35
FFAR3 O14843 2/20 0.32
HDAC3 O15379 2/20 0.32
HDAC1 Q13547 2/20 0.32
HDAC2 Q92769 2/20 0.32
HDAC8 Q9BY41 2/20 0.32
ALDH1A1 P00352 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CA4 P22748 1/20 0.32
GAA P10253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9577856 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL10415391 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219169 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219179 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219171 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219181 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21519878 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219167 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219173 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL17968609 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180312623-A1 Polyurethane Elastomer with High Ultimate Elongation WANG LIANG (US) 2018-11-01 US claimed
US-8999589-B2 Nonaqueous secondary battery SANYO ELECTRIC CO., LTD. (JP) 2015-04-07 US claimed
EP-1178150-B1 Diorganopolysiloxane/acrylate ester copolymer emulsion composition for fabric treatment DOW CORNING TORAY SILICONE (JP) 2003-12-03 EP claimed
EP-1178150-A1 Diorganopolysiloxane/acrylate ester copolymer emulsion composition for fabric treatment Dow Corning Toray Silicone Co., Ltd. (JP) 2002-02-06 EP claimed
US-5905109-A HYDROLYSIS AND CONDENSATION TO FORM POLYMERS WITH CATALYSTS JSR CORPORATION (JP) 1999-05-18 US claimed
WO-2025041813-A1 COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ASSEMBLY 日産化学株式会社 2025-02-27 WO disclosed
US-20240419073-A1 ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2024-12-19 US disclosed
US-20240393693-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMINATE USING THE COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT NISSAN CHEMICAL CORPORATION (JP) 2024-11-28 US disclosed
WO-2024237188-A1 MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER 日産化学株式会社 2024-11-21 WO disclosed
WO-2024225431-A1 COMPOSITION FOR FORMING WET-REMOVABLE SILICON-CONTAINING RESIST UNDERLAYER FILM 日産化学株式会社 2024-10-31 WO disclosed
WO-2024195705-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM FOR i-RAY LITHOGRAPHY 日産化学株式会社 2024-09-26 WO disclosed
WO-2024185665-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM 日産化学株式会社 2024-09-12 WO disclosed
US-6335061-B1 FORMING ON SURFACE OF AN ORGANIC FILM AN (UNDER)COATING OF A COATING COMPOSED OF ORGANOSILANES, HYDROLYZATES OF THE ORGANOSILANES, AND CONDENSATES OF THE ORGANOSILANES AND, WHEN DESIRED, A POLYMER COMPONENT HAVING SILYL GROUPS JSR CORPORATION (JP) 2002-01-01 US disclosed
EP-0964023-B1 Silicone oil emulsion, compositions, and method of manufacture DOW CORNING TORAY SILICONE (JP) 2001-11-14 EP disclosed
US-20010009936-A1 Method of manufacturing material for forming insulating film JSR CORPORATION (JP) 2001-07-26 US disclosed
EP-1117102-A2 Method of manufacturing material for forming insulating film JSR Corporation (JP) 2001-07-18 EP disclosed
EP-1106661-A2 Coating composition and hardened film obtained therefrom JSR Corporation (JP) 2001-06-13 EP disclosed
EP-1022319-A2 Method of making coating layers containing photocatalyst and a photocatalyst coating glass formed thereby JSR Corporation (JP) 2000-07-26 EP disclosed
EP-1022318-A2 Method of making coating layers containing photocatalyst and a photocatalyst coating film formed thereby JSR Corporation (JP) 2000-07-26 EP disclosed
EP-0964023-A2 Silicone oil emulsion, compositions, and method of manufacture Dow Corning Toray Silicone Company, Ltd. (JP) 1999-12-15 EP disclosed