Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.41 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 3/20 | 0.37 |
| ▸ | CES1 | P23141 | 3/20 | 0.37 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.36 |
| ▸ | PPARG | P37231 | 7/20 | 0.36 |
| ▸ | PPARD | Q03181 | 7/20 | 0.36 |
| ▸ | PPARA | Q07869 | 7/20 | 0.36 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.36 |
| ▸ | TSHR | P16473 | 4/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | TLR2 | O60603 | 2/20 | 0.36 |
| ▸ | FABP4 | P15090 | 2/20 | 0.36 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.36 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | ESR1 | P03372 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11000950 | 0.84 | TDP1 (0.56) | KMT2AMAPTTDP1HAO1CES2 | |
| SCHEMBL12299385 | 0.84 | TDP1 (0.56) | KMT2AMAPTTDP1HAO1CES2 | |
| SCHEMBL17776278 | 0.84 | TDP1 (0.56) | KMT2AMAPTTDP1HAO1CES2 | |
| SCHEMBL13232045 | 0.84 | TDP1 (0.56) | KMT2AMAPTTDP1HAO1CES2 | |
| SCHEMBL1707003 | 0.84 | TDP1 (0.56) | KMT2AMAPTTDP1HAO1CES2 | |
| SCHEMBL9445286 | 0.82 | — | — | |
| SCHEMBL12673292 | 0.82 | TDP1 (0.60) | KMT2AMAPTTDP1HAO1CES2 | |
| SCHEMBL25815473 | 0.81 | KMT2A (0.41) | KMT2AMAPTTDP1HAO1CES2 | |
| SCHEMBL25982307 | 0.81 | KMT2A (0.46) | KMT2AMAPTTDP1HAO1GPR84 | |
| Ethylene SCHEMBL8430230 | 0.81 | PAOX (0.50) | KMT2AMAPTTDP1HAO1CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1763706-B1 | METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD | CANON KK (JP) | 2013-12-11 | — | — | EP | claimed |
| EP-1957282-B1 | LIQUID DISCHARGE HEAD PRODUCING METHOD | CANON KK (JP) | 2013-04-10 | — | — | EP | claimed |
| EP-1380425-B1 | Method of producing microstructure, and method of producing liquid discharge head | CANON KK (JP) | 2011-02-02 | — | — | EP | claimed |
| EP-1768848-B1 | LIQUID DISCHARGE HEAD MANUFACTURING METHOD, AND LIQUID DISCHARGE HEAD OBTAINED USING THIS METHOD | CANON KK (JP) | 2010-07-21 | — | — | EP | claimed |
| EP-1768847-B1 | LIQUID DISCHARGE HEAD MANUFACTURING METHOD, AND LIQUID DISCHARGE HEAD OBTAINED USING THIS METHOD | CANON KK (JP) | 2009-08-12 | — | — | EP | claimed |
| EP-1380422-B1 | Method of manufacturing microstructure, method of manufacturing liquid discharge head, and liquid discharge head | CANON KK (JP) | 2008-06-11 | — | — | EP | claimed |
| EP-0895082-B1 | Bubble jet method for spotting probes on a solid support and method of manufacturing probe arrays. | CANON KK (JP) | 2003-09-24 | — | — | EP | claimed |
| EP-0783970-B1 | Process for the production of a liquid jet recording head | CANON KK (JP) | 2003-05-14 | — | — | EP | claimed |
| EP-0450008-B1 | PREPARATION OF UNSATURATED KETONES FROM KETONES AND PARAFORMALDEHYDE (II) | ARISTECH CHEMICAL CORP (US) | 1996-08-21 | — | — | EP | claimed |
| EP-0404453-B1 | Dimer reduction | NOVA PETROCHEMICALS INC (CA) | 1994-02-23 | — | — | EP | claimed |
| EP-0197285-B1 | SULFURIZED GUAYULE RESIN AND RUBBER COMPOSITIONS CONTAINING THE SAME | THE FIRESTONE TIRE & RUBBER COMPANY (US) | 1989-08-09 | — | — | EP | claimed |
| EP-0082417-B1 | SELECTIVE ETCHING METHOD OF POLYIMIDE TYPE RESIN FILM | Hitachi, Ltd. (JP) | 1989-03-15 | — | — | EP | claimed |
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | claimed |
| EP-0091033-B1 | TRIMETHYLBICYCLO(4.3.0)NON-1-ENE DERIVATIVES, THEIR PREPARATION AND USE AS PERFUMES, AND THE PERFUMED COMPOSITIONS CONTAINING THEM | Henkel Kommanditgesellschaft auf Aktien (DE) | 1985-06-26 | — | — | EP | claimed |
| WO-2013036163-A1 | METHOD FOR FORMING A MASKING IMAGE IN POSITIVE ELECTRONIC RESISTS | BRUK MARK AVRAMOVICH (RU) | 2013-03-14 | — | — | WO | disclosed |
| EP-0436447-B1 | Asymmetric semipermeable membrane for the treatment of biological liquids | HOSPAL IND (FR) | 1994-06-01 | — | — | EP | disclosed |
| EP-0436447-A1 | Asymmetric semipermeable membrane for the treatment of biological liquids | HOSPAL INDUSTRIE (FR) | 1991-07-10 | — | — | EP | disclosed |
| EP-0082163-A1 | ELECTROSTATIC, MAGNETIC DEVELOPERS, PREPARATION AND UTILIZATIONS THEREOF | SUBLIGRAPHICS S.A. (CH) | 1983-06-29 | — | — | EP | disclosed |
| WO-1983000235-A1 | ELECTROSTATIC, MAGNETIC DEVELOPERS, PREPARATION AND UTILIZATIONS THEREOF | HENDRIKS, DIETER | 1983-01-20 | — | — | WO | disclosed |