SCHEMBL125652

SCHEMBL125652

O=C1CC(=O)C2CCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4747114 0.86
SCHEMBL3023713 0.86 DAO (0.31)
Cadaverine Tartrate SCHEMBL25252489 0.79 TSHR (0.42)
SCHEMBL4611126 0.75 CA1 (0.40)
SCHEMBL3224313 0.73 CA1 (0.32)
SCHEMBL15957272 0.73 CA1 (0.32)
SCHEMBL8569287 0.73 CA1 (0.44)
SCHEMBL21335065 0.72 DAO (0.31)
SCHEMBL1882552 0.72
SCHEMBL3165967 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250013149-A1 ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND APPLICATION OF ADDITIVE CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) 2025-01-09 US claimed
CN-118184496-A Process for preparing bicyclo [3.2.1] octane-2, 4-dione 江苏食品药品职业技术学院 2024-06-14 CN claimed
US-12351564-B2 NLRP3 modulators ZOMAGEN BIOSCIENCES LTD (US) 2025-07-08 US disclosed
CN-120192289-A Synthesis method of multi-functional 2-alkenyl furan-ring-4-ketone and 5-alkenyl-3-furan carbonyl compound 首都医科大学 2025-06-24 CN disclosed
CN-116144016-B 193Nm dry photoresist additive and preparation method and application thereof 上海新阳半导体材料股份有限公司 2025-02-14 CN disclosed
CN-116144014-B 193Nm dry photoresist additive and preparation method and application thereof 上海新阳半导体材料股份有限公司 2025-02-14 CN disclosed
US-20250013149-A1 ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND APPLICATION OF ADDITIVE CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) 2025-01-09 US disclosed
CN-116144015-B 193Nm dry photoresist additive and preparation method and application thereof 上海新阳半导体材料股份有限公司 2024-11-19 CN disclosed
CN-114555569-B NLRP3 modulators 祖玛珍生物科学有限公司 2024-10-29 CN disclosed
CN-118475238-A Surfactant combinations for aqueous agrochemical (crop protection) suspension formulations with high salt content and low concentration of sulfonylurea herbicides 拜耳公司 2024-08-09 CN disclosed
CN-118184496-A Process for preparing bicyclo [3.2.1] octane-2, 4-dione 江苏食品药品职业技术学院 2024-06-14 CN disclosed
WO-2001054501-A2 HERBICIDAL COMPOSITION SYNGENTA PARTICIPATIONS AG (CH) 2001-08-02 WO disclosed
EP-1114030-A1 PYRIDINE KETONES USEFUL AS HERBICIDES Syngenta Participations AG (CH) 2001-07-11 EP disclosed
WO-2000037437-A1 NOVEL HERBICIDES SYNGENTA PARTICIPATIONS AG (CH) 2000-06-29 WO disclosed
WO-2000015615-A1 PYRIDINE KETONES USEFUL AS HERBICIDES SYNGENTA PARTICIPATIONS AG (CH) 2000-03-23 WO disclosed
US-5608101-A HERBICIDES NOVARTIS AG (CH) 1997-03-04 US disclosed
EP-0737185-A1 7- CARBOXYALKYL OR ALKENYL]-6- ALKYL OR ALKENYL] 3-OXO-2,4-DIOXOBICYCLO- 3.2.1] OCTANE AND DERIVATIVES THEREOF Allergan (US) 1996-10-16 EP disclosed
US-5525580-A USED TO PREVENT WEEDS IN PADDY FIELDS SDS BIOTECH K.K. (JP) 1996-06-11 US disclosed
WO-1995018103-A1 7-[CARBOXYALKYL OR ALKENYL]-6-[ALKYL OR ALKENYL] 3-OXO-2,4-DIOXOBICYCLO-[3.2.1] OCTANE AND DERIVATIVES THEREOF ALLERGAN (US) 1995-07-06 WO disclosed
EP-0338992-A2 Substituted aryl and heteroaryl bicyclodiones SANDOZ AG (CH) 1989-10-25 EP disclosed