⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17613284 | 0.90 | — | — | |
| SCHEMBL682150 | 0.87 | — | — | |
| SCHEMBL2996373 | 0.79 | — | — | |
| SCHEMBL12198817 | 0.78 | — | — | |
| SCHEMBL12302807 | 0.78 | — | — | |
| SCHEMBL12198823 | 0.78 | — | — | |
| SCHEMBL14925296 | 0.78 | — | — | |
| SCHEMBL12198815 | 0.78 | — | — | |
| SCHEMBL13287711 | 0.78 | — | — | |
| SCHEMBL8378558 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230365458-A1 | RESIN-COATED ULTRA-THIN GLASS | TORAY INDUSTRIES, INC. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-9690218-B2 | Intermediate transfer member | XEROX CORPORATION (US) | 2017-06-27 | — | — | US | disclosed |
| US-20160083564-A1 | POLYAMIDE RESIN COMPOSITION, AND MOLDED ARTICLE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-03-24 | — | — | US | disclosed |
| US-20150064401-A1 | GAS BARRIER FILM AND ELECTRONIC DEVICE | Konica Minolta, Inc. (JP) | 2015-03-05 | — | — | US | disclosed |
| US-8318401-B2 | Positive typed photosensitive composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2012-11-27 | — | — | US | disclosed |
| US-20110183115-A1 | POSITIVE TYPED PHOTOSENSITIVE COMPOSITION | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2011-07-28 | — | — | US | disclosed |
| US-7964692-B2 | Polymer obtained by addition-polymerization initiated by a silicon compound | JNC CORPORATION (JP) | 2011-06-21 | — | — | US | disclosed |
| US-7863396-B2 | Silicon compounds | CHISSO CORPORATION (JP) | 2011-01-04 | — | — | US | disclosed |
| US-7834120-B2 | Monofunctional monomer having cage oligosiloxane structure and method of making | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| US-7662985-B2 | Polysilsesquioxanes; addition-condensation copolymers | CHISSO CORPORATION (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7563917-B2 | Silicon compound and a production process for silicon compound | CHISSO CORPORATION (JP) | 2009-07-21 | — | — | US | disclosed |
| US-20090143606-A1 | Production process for a silicon compound | JNC CORPORATION (JP) | 2009-06-04 | — | — | US | disclosed |
| US-20090137765-A1 | Polymer obtained by addition-polymerization initiated by a silicon compound | JNC CORPORATION (JP) | 2009-05-28 | — | — | US | disclosed |
| US-7399819-B2 | Silicon compound | CHISSO CORPORATION (JP) | 2008-07-15 | — | — | US | disclosed |
| US-7294732-B2 | Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers | CHISSO CORPORATION (JP) | 2007-11-13 | — | — | US | disclosed |
| US-7235619-B2 | Silsesquioxane derivative | CHISSO CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20070004932-A1 | Silicon compound and a production process for silicon compound | JNC CORPORATION (JP) | 2007-01-04 | — | — | US | disclosed |