SCHEMBL1267433

SCHEMBL1267433

CCCC(C#N)N=NC(C)(C#N)CC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1267432 1.00
SCHEMBL8623687 0.90
SCHEMBL7786611 0.83
SCHEMBL7786609 0.83
SCHEMBL7196370 0.80
SCHEMBL14898 0.78
SCHEMBL14897 0.78
SCHEMBL27970435 0.78
SCHEMBL26739247 0.78
SCHEMBL8623680 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140178667-A1 Oleophobic Laminated Article BHA ALTAIR, LLC (US) 2014-06-26 US disclosed
US-8735306-B2 Oleophobic laminated article BHA ALTAIR, LLC (US) 2014-05-27 US disclosed
US-8388885-B2 Membrane structure for vacuum assisted molding fiber reinforced article GENERAL ELECTRIC COMPANY (US) 2013-03-05 US disclosed
US-20110041693-A1 OLEOPHOBIC LAMINATED ARTICLE GENERAL ELECTRIC COMPANY 2011-02-24 US disclosed
US-20100285297-A1 MEMBRANE STRUCTURE FOR VACUUM ASSISTED MOLDING FIBER REINFORCED ARTICLE GENERAL ELECTRIC COMPANY 2010-11-11 US disclosed
US-7825046-B2 Oleophobic laminated article GENERAL ELECTRIC COMPANY (US) 2010-11-02 US disclosed
US-20090220763-A1 OLEOPHOBIC LAMINATED ARTICLE BHA GROUP, INC. 2009-09-03 US disclosed
US-20090220764-A1 OLEOPHOBIC LAMINATED ARTICLE AND METHOD BHA GROUP, INC. 2009-09-03 US disclosed
EP-1551887-A4 FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY DU PONT (US) 2008-07-02 EP disclosed
US-7019092-B2 Fluorinated copolymers for microlithography E. I. DU PONT DE NEMOURS AND COMPANY (US) 2006-03-28 US disclosed
EP-1551887-A1 FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY E. I. du Pont de Nemours and Company (US) 2005-07-13 EP disclosed
US-20050020793-A1 Fluorinated copolymers for microlithography E. I. DU PONT DE NEMOURS AND COMPANY 2005-01-27 US disclosed
EP-1481285-A1 FLUORINATED COPOLYMERS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2004-12-01 EP disclosed
EP-1095071-B1 AROMATIC POLYMERS WITH PENDANT FLUORINATED IONIC GROUPS DU PONT (US) 2004-06-16 EP disclosed
WO-2004011509-A1 FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY E. I. DU PONT DE NEMOURS AND COMPANY (US) 2004-02-05 WO disclosed
US-20030211417-A1 Polymers for photoresist compositions for microlithography DUPONT ELECTRONICS, INC. 2003-11-13 US disclosed
WO-2003075094-A1 FLUORINATED COPOLYMERS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2003-09-12 WO disclosed
EP-1095071-A1 AROMATIC POLYMERS WITH PENDANT FLUORINATED IONIC GROUPS E.I. DUPONT DE NEMOURS AND COMPANY (US) 2001-05-02 EP disclosed
WO-1999067304-A1 AROMATIC POLYMERS WITH PENDANT FLUORINATED IONIC GROUPS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-12-29 WO disclosed
US-4539380-A INORGANIC SALTS AS EMULSIFIERS FORMOSA PLASTICS CORPORATION (TW) 1985-09-03 US disclosed