Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
| ▸ | CA9 | Q16790 | 1/20 | 0.50 |
| ▸ | TTR | P02766 | 2/20 | 0.47 |
| ▸ | F2 | P00734 | 3/20 | 0.46 |
| ▸ | PRSS1 | P07477 | 3/20 | 0.46 |
| ▸ | PRSS2 | P07478 | 3/20 | 0.46 |
| ▸ | PRSS3 | P35030 | 3/20 | 0.46 |
| ▸ | CTRB1 | P17538 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | FABP4 | P15090 | 1/20 | 0.43 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.43 |
| ▸ | CDK2 | P24941 | 1/20 | 0.43 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.43 |
| ▸ | HTR6 | P50406 | 2/20 | 0.42 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.42 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Pyridine SCHEMBL1270547 | 1.00 | CA1 (0.50) | CA1CA2CA9TTRF2 | |
| Benzene SCHEMBL8992706 | 0.89 | CA1 (0.61) | CA1CA2CA9TTRF2 | |
| Methyl Alcohol SCHEMBL28292348 | 0.87 | CA1 (0.59) | CA1CA2CA9TTRF2 | |
| SCHEMBL27719293 | 0.87 | CA1 (0.63) | CA1CA2CA9TTRF2 | |
| SCHEMBL29358913 | 0.87 | CA1 (0.63) | CA1CA2CA9TTRF2 | |
| SCHEMBL4323 | 0.87 | CA1 (0.63) | CA1CA2CA9TTRF2 | |
| SCHEMBL30304762 | 0.87 | CA1 (0.63) | CA1CA2CA9TTRF2 | |
| SCHEMBL17961259 | 0.86 | CA1 (0.53) | CA1CA2CA9TTRF2 | |
| Bicarbonate SCHEMBL27388751 | 0.85 | CA1 (0.57) | CA1CA2CA9TTRF2 | |
| Phosphine SCHEMBL25249741 | 0.85 | CA1 (0.61) | CA1CA2CA9TTRF2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111377897-A | Synthetic method of aromatic rose oxide perfume | 国际香料和香精公司 | 2020-07-07 | — | — | CN | claimed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| WO-2024247656-A1 | LAMINATE | 日産化学株式会社 | 2024-12-05 | — | — | WO | disclosed |
| US-12030974-B2 | Composition for forming block copolymer layer for formation of microphase-separated pattern | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-11815815-B2 | Composition for forming silicon-containing resist underlayer film removable by wet process | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| CN-116917399-A | Composition for forming release layer and release layer | 日产化学株式会社 | 2023-10-20 | — | — | CN | disclosed |
| US-11674053-B2 | Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-06-13 | — | — | US | disclosed |
| CN-110945078-B | Composition for forming release layer and release layer | 日产化学株式会社 | 2023-03-31 | — | — | CN | disclosed |
| WO-2022239785-A1 | COMPOSITION FOR FORMING RELEASE LAYER, AND RELEASE LAYER | 日産化学株式会社 | 2022-11-17 | — | — | WO | disclosed |
| US-11440985-B2 | Underlayer film-forming composition for use in forming a microphase-separated pattern | NISSAN CHEMICAL CORPORATION (JP) | 2022-09-13 | — | — | US | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20070292767-A1 | photoresists; semiconductors | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-20 | — | — | US | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| EP-1811342-A1 | SULFUR-ATOM-CONTAINING COMPOSITION FOR FORMING OF LITHOGRAPHIC ANTIREFLECTION FILM | Nissan Chemical Industries, Ltd. (JP) | 2007-07-25 | — | — | EP | disclosed |
| US-20070148557-A1 | Composition for forming nitride coating film for hard mask | NISSAN CHEMICAL INDUSTRIES, LT. (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070135581-A1 | Underlayer coating forming composition containing dextrin ester compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| EP-1757985-A1 | ANTIREFLECTIVE FILM CONTAINING SULFUR ATOM | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1703328-A1 | COMPOSITION FOR FORMING NITRIDE COATING FILM FOR HARD MASK | Nissan Chemical Industries, Ltd. (JP) | 2006-09-20 | — | — | EP | disclosed |
| EP-1681594-A1 | COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-07-19 | — | — | EP | disclosed |