⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Silicate SCHEMBL8425116 | 0.77 | — | — | |
| Silicate SCHEMBL11227548 | 0.77 | — | — | |
| Silicate SCHEMBL1169 | 0.77 | — | — | |
| Silicate SCHEMBL981237 | 0.77 | — | — | |
| Silicate SCHEMBL6264763 | 0.77 | — | — | |
| Silicate SCHEMBL21268596 | 0.77 | — | — | |
| Silicate SCHEMBL23282464 | 0.71 | — | — | |
| Silicate SCHEMBL20943440 | 0.71 | — | — | |
| Silicate SCHEMBL20872944 | 0.71 | — | — | |
| Silicate SCHEMBL20943437 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8409997-B2 | Apparatus and method for controlling silicon nitride etching tank | Taiwan Semiconductor Maufacturing Co., Ltd. (TW) | 2013-04-02 | — | — | US | disclosed |
| US-7910014-B2 | Method and system for improving wet chemical bath process stability and productivity in semiconductor manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2011-03-22 | — | — | US | disclosed |
| US-7737232-B2 | Halogenating rare earth oxides with organic or inorganic halides of silicon, germanium, tin, titanium, zirconium or hafnium in an aprotic, polar solvent; catalysts for polymerization, condensation, aldol reaction, acetal formation, carbon-carbon coupling or ring-opening reaction | CHEMETALL GMBH (DE) | 2010-06-15 | — | — | US | disclosed |
| US-20090087929-A1 | METHOD AND SYSTEM FOR IMPROVING WET CHEMICAL BATH PROCESS STABILITY AND PRODUCTIVITY IN SEMICONDUCTOR MANUFACTURING | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2009-04-02 | — | — | US | disclosed |
| US-20080179293-A1 | APPARATUS AND METHOD FOR CONTROLLING SILICON NITRIDE ETCHING TANK | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2008-07-31 | — | — | US | disclosed |
| US-20080125557-A1 | Method For The Production Of Water-Free Rare Earth Metal Halogenides, Synthesis Mixtures Containing Water-Free Rare Earth Metal Halogenides And Use Thereof | CHEMETALL GMBH (DE) | 2008-05-29 | — | — | US | disclosed |
| US-20080083970-A1 | Method and materials for growing III-nitride semiconductor compounds containing aluminum | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2008-04-10 | — | — | US | disclosed |