⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12762013 | 0.95 | — | — | |
| SCHEMBL14199628 | 0.93 | — | — | |
| SCHEMBL14199618 | 0.91 | — | — | |
| SCHEMBL12762015 | 0.87 | — | — | |
| SCHEMBL12762024 | 0.87 | — | — | |
| SCHEMBL12762023 | 0.86 | — | — | |
| SCHEMBL14199636 | 0.85 | — | — | |
| SCHEMBL12762012 | 0.85 | — | — | |
| SCHEMBL12762028 | 0.85 | — | — | |
| SCHEMBL12762002 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-7390613-B1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-06-24 | — | — | US | disclosed |
| US-20080131810-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-05 | — | — | US | disclosed |
| US-7351515-B2 | Positive resist composition and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2008-04-01 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |