⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7695980 | 0.67 | — | — | |
| SCHEMBL7698125 | 0.62 | — | — | |
| SCHEMBL42541 | 0.59 | — | — | |
| SCHEMBL4136328 | 0.59 | — | — | |
| SCHEMBL5704802 | 0.59 | — | — | |
| SCHEMBL84475 | 0.59 | — | — | |
| SCHEMBL1217 | 0.59 | — | — | |
| SCHEMBL21467 | 0.56 | — | — | |
| SCHEMBL11134529 | 0.56 | — | — | |
| SCHEMBL5270649 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6465548-B1 | 6-HYDROXYCHROMAN DERIVATIVE WITH PHOSPHORUS AND PHENOLIC ANTIOXIDANTS; HEAT, LIGHT AND OXIDATION STABILITY DURING MOLDING | YOSHITOMI FINE CHEMICALS, LTD. (JP) | 2002-10-15 | — | — | US | claimed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-20240069441-A1 | COMPOSITION FOR RESIST UNDERLYING FILM FORMATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| US-20230168582-A1 | COMPOSITION FOR FORMING RESIST UNDERLYING FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-01 | — | — | US | disclosed |
| US-20230152700-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| WO-2022210901-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-20220187709-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-06-16 | — | — | US | disclosed |
| US-20220177653-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-06-09 | — | — | US | disclosed |
| EP-1478785-A1 | LOW-VOC STUFFING AGENTS, THE USE THEREOF IN THE PRODUCTION AND/OR TREATMENT OF LEATHER AND SKINS AND CORRESPONDING PRODUCTION OR TREATMENT METHOD | BASF AKTIENGESELLSCHAFT (DE) | 2004-11-24 | — | — | EP | disclosed |
| WO-2003070988-A1 | LOW-VOC STUFFING AGENTS, THE USE THEREOF IN THE PRODUCTION AND/OR TREATMENT OF LEATHER AND SKINS AND CORRESPONDING PRODUCTION OR TREATMENT METHOD | BASF AKTIENGESELLSCHAFT (DE) | 2003-08-28 | — | — | WO | disclosed |
| US-6465548-B1 | 6-HYDROXYCHROMAN DERIVATIVE WITH PHOSPHORUS AND PHENOLIC ANTIOXIDANTS; HEAT, LIGHT AND OXIDATION STABILITY DURING MOLDING | YOSHITOMI FINE CHEMICALS, LTD. (JP) | 2002-10-15 | — | — | US | disclosed |
| US-6335143-B1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2002-01-01 | — | — | US | disclosed |
| EP-1061076-A1 | N-ACYL CYCLIC AMINE DERIVATIVES | BANYU PHARMACEUTICAL CO., LTD. (JP) | 2000-12-20 | — | — | EP | disclosed |
| US-6140333-A | FOR TREATMENT AND/OR PROPHYLAXIS OF DISEASES INCLUDE SUCH RESPIRATORY DISEASES AS CHRONIC OBSTRUCTIVE PULMONARY DISEASES, CHRONIC BRONCHITIS, ASTHMA, CHRONIC RESPIRATORY OBSTRUCTION, PULMONARY FIBROSIS, PULMONARY EMPHYSEMA | BANYU PHARMACEUTICAL CO LTD (JP) | 2000-10-31 | — | — | US | disclosed |
| EP-0887706-A1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 1998-12-30 | — | — | EP | disclosed |
| US-5410015-A | Adding a phenolic compound such as tri(p-hydroxyphenyl)methane | BASF AKTIENGESELLSCHAFT (DE) | 1995-04-25 | — | — | US | disclosed |
| EP-0520219-A2 | Low water-absorption capacity polyamide | BASF Aktiengesellschaft (DE) | 1992-12-30 | — | — | EP | disclosed |
| US-4107136-A | Synthetic resin stabilizer comprising an organic phosphite and a carbonate | ARGUS CHEMICAL CORPORATION (US) | 1978-08-15 | — | — | US | disclosed |