⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6392831 | 0.72 | — | — | |
| SCHEMBL8729849 | 0.72 | — | — | |
| SCHEMBL845879 | 0.72 | — | — | |
| SCHEMBL522171 | 0.72 | — | — | |
| SCHEMBL9124 | 0.67 | — | — | |
| SCHEMBL19511844 | 0.62 | — | — | |
| SCHEMBL27560172 | 0.62 | — | — | |
| SCHEMBL27371868 | 0.62 | — | — | |
| SCHEMBL406 | 0.61 | — | — | |
| SCHEMBL4136354 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-20240069441-A1 | COMPOSITION FOR RESIST UNDERLYING FILM FORMATION | NISSAN CHEMICAL CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| WO-2023157943-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UNSATURATED BOND AND CYCLIC STRUCTURE | 日産化学株式会社 | 2023-08-24 | — | — | WO | disclosed |
| WO-2023136250-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2023-07-20 | — | — | WO | disclosed |
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| US-20230168582-A1 | COMPOSITION FOR FORMING RESIST UNDERLYING FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-01 | — | — | US | disclosed |
| US-20230152700-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| WO-2023037979-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, MULTILAYER BODY USING SAID COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | 日産化学株式会社 | 2023-03-16 | — | — | WO | disclosed |
| EP-1061076-B1 | N-ACYL CYCLIC AMINE DERIVATIVES | BANYU PHARMA CO LTD (JP) | 2004-12-08 | — | — | EP | disclosed |
| EP-0915865-B1 | COVALENTLY IMMOBILISED FLUOROIONOPHORES FOR OPTICAL ION SENSORS | NOVARTIS AG (CH) | 2002-02-20 | — | — | EP | disclosed |
| US-6335143-B1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2002-01-01 | — | — | US | disclosed |
| US-6294390-B1 | COMPOUND CONSISTING OF IONOPHORE, FLUOROPHORE, AND A FUNCTIONAL GROUP BOUND TOGETHER THROUGH A TRIVALENT ORGANIC RADICAL; SENSORS HAVING LONG USABLE LIFE AND A HIGH DEGREE OF SENSITIVITY | NOVARTIS AG (CH) | 2001-09-25 | — | — | US | disclosed |
| EP-1061076-A1 | N-ACYL CYCLIC AMINE DERIVATIVES | BANYU PHARMACEUTICAL CO., LTD. (JP) | 2000-12-20 | — | — | EP | disclosed |
| US-6140333-A | FOR TREATMENT AND/OR PROPHYLAXIS OF DISEASES INCLUDE SUCH RESPIRATORY DISEASES AS CHRONIC OBSTRUCTIVE PULMONARY DISEASES, CHRONIC BRONCHITIS, ASTHMA, CHRONIC RESPIRATORY OBSTRUCTION, PULMONARY FIBROSIS, PULMONARY EMPHYSEMA | BANYU PHARMACEUTICAL CO LTD (JP) | 2000-10-31 | — | — | US | disclosed |
| WO-1998003497-A9 | COVALENTLY IMMOBILISED FLUOROIONOPHORES FOR OPTICAL ION SENSORS | NOVARTIS AG (CH) | 1999-10-28 | — | — | WO | disclosed |
| EP-0915865-A1 | COVALENTLY IMMOBILISED FLUOROIONOPHORES FOR OPTICAL ION SENSORS | Novartis AG (CH) | 1999-05-19 | — | — | EP | disclosed |
| EP-0887706-A1 | Resist composition containing specific cross-linking agent | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 1998-12-30 | — | — | EP | disclosed |
| WO-1998003497-A1 | COVALENTLY IMMOBILISED FLUOROIONOPHORES FOR OPTICAL ION SENSORS | NOVARTIS AG (CH) | 1998-01-29 | — | — | WO | disclosed |