SCHEMBL12782870

SCHEMBL12782870

C=C(C)C(=O)NC1(C2CCCCC2)C2CC3CC1CC(C)(C3)C2

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 7/20 0.33
EPHX1 P07099 3/20 0.33
SIGMAR1 Q99720 1/20 0.33
ALDH1A1 P00352 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12782864 0.99 EPHX2 (0.31) EPHX2EPHX1SIGMAR1ALDH1A1TSHR
SCHEMBL12782881 0.88
SCHEMBL12782892 0.88
SCHEMBL12782880 0.87
SCHEMBL12782833 0.85 EPHX1 (0.33) EPHX2EPHX1SIGMAR1ALDH1A1
SCHEMBL12782834 0.84 EPHX1 (0.31) EPHX2EPHX1SIGMAR1ALDH1A1
SCHEMBL12782869 0.82 EPHX2 (0.36) EPHX2EPHX1
SCHEMBL12782875 0.82
SCHEMBL12782865 0.81 EPHX2 (0.34) EPHX2EPHX1ALDH1A1TSHR
SCHEMBL12782890 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed