SCHEMBL127927

SCHEMBL127927

C[CH]OC(C)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6380410 0.78
SCHEMBL6178393 0.78 TSHR (0.32)
SCHEMBL10044228 0.77
SCHEMBL892040 0.77
SCHEMBL3315434 0.77
SCHEMBL892041 0.77
SCHEMBL6437663 0.73
SCHEMBL232811 0.73
SCHEMBL439331 0.73
SCHEMBL27984 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 626 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100507716-C Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device TOYKO OHKA KOGYO CO LTD (JP) 2009-07-01 CN claimed
CN-1740911-A Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device TOYKO OHKA KOGYO CO LTD (JP) 2006-03-01 CN claimed
US-6921621-B2 Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device TOKYO OHKA KOGYO CO., LTD. (JP) 2005-07-26 US claimed
CN-1520534-A Photoresist composition, laminated material, pattern forming method and method for manufacturing semiconductor device ͬ�Ϳ�ҵ��ʽ���� 2004-08-11 CN claimed
EP-1400853-A1 POSITIVE RESIST COMPOSITION OF CHEMICAL AMPLIFICATION TYPE, RESIST COATED MATERIAL, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2004-03-24 EP claimed
US-20030190550-A1 Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device TOKYO OHKA KOGYO CO., LTD. (JP) 2003-10-09 US claimed
US-6455223-B1 COMPOSITION COMPRISING AS BASE RESIN DENDRITIC OR HYPERBRANCHED POLYMER OF PHENOL DERIVATIVE HAVING SPECIFIED WEIGHT AVERAGE MOLECULAR WEIGHT; HIGH RESOLUTION, HIGH SENSITIVITY, MINIMIZED LINE EDGE ROUGHNESS, ETCH RESISTANCE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-09-24 US claimed
US-6369279-B1 STYRENE WITH ETHER OR FLUORINE GROUPS FOR POLYMERS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-04-09 US claimed
EP-4143167-B1 PESTICIDAL COMPOUNDS BASF SE (DE) 2024-05-15 EP disclosed
US-20240116916-A1 METHOD FOR PREPARING AN ENANTIOMERICALLY ENRICHED FORM OF 2-[2-(2-CHLOROTHIAZOL-5-YL)-2-HYDROXY-ETHYL]SULFANYL-6-HYDROXY-3-METHYL-5-PHENYL-PYRIMIDIN-4-ONE BASF SE (DE) 2024-04-11 US disclosed
US-20240101575-A1 METHOD FOR PREPARING AN ENANTIOMERICALLY ENRICHED FORM OF 3-(2-CHLOROTHIAZOL-5-YL)-8-METHYL-7-OXO-6-PHENYL-2,3-DIHYDROTHIAZOLO[3,2-A]PYRIMIDIN-4-IUM-5-OLATE BASF SE (DE) 2024-03-28 US disclosed
WO-2024061768-A1 AZOLE PESTICIDAL COMPOUNDS BASF SE (DE) 2024-03-28 WO disclosed
WO-2024028243-A1 PYRAZOLO PESTICIDAL COMPOUNDS BASF SE (DE) 2024-02-08 WO disclosed
CN-111491925-B Pesticidal compounds 巴斯夫欧洲公司 2023-12-29 CN disclosed
WO-1993006090-A1 SUBSTITUTED 3-PHENYLURACILS AS HERBICIDES BASF AKTIENGESELLSCHAFT (DE) 1993-04-01 WO disclosed
WO-1993004057-A2 HERBICIDES CONTAINING 3-AMINOBENZO[B]THIOPHENES AS AN ANTIDOTE BASF AKTIENGESELLSCHAFT (DE) 1993-03-04 WO disclosed
US-5179210-A PREPARATION OF N-SUBSTITUTED IMIDAZOLES BASF AKTIENGESELLSCHAFT (DE) 1993-01-12 US disclosed
US-5064818-A PESTICIDAL PYRIMIDINYL (THIONO) (THIO)-PHOSPHORIC (PHOSPHONIC)ACID (AMIDE) ESTERS BAYER AKTIENGESELLSCHAFT (DE) 1991-11-12 US disclosed
EP-0395968-A1 (Thiono) (thio)pyrimidyl-phosphonyl (phosphonic) ester (amid) BAYER AG (DE) 1990-11-07 EP disclosed
EP-0389162-A1 2,5,6,7-Tetranor-4,8-inter-m-phenylene PGI2 derivatives TORAY INDUSTRIES, INC. (JP) 1990-09-26 EP disclosed