⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24978970 | 0.90 | — | — | |
| SCHEMBL24978967 | 0.90 | — | — | |
| SCHEMBL14276061 | 0.89 | — | — | |
| SCHEMBL24352169 | 0.89 | — | — | |
| SCHEMBL24449886 | 0.89 | — | — | |
| SCHEMBL15029759 | 0.87 | CHRM2 (0.33) | — | |
| SCHEMBL22710155 | 0.85 | — | — | |
| SCHEMBL16378578 | 0.84 | — | — | |
| SCHEMBL16378532 | 0.84 | — | — | |
| SCHEMBL25549315 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119065201-A | Radiation-sensitive composition, cured film, method for producing same, semiconductor element, and display element | JSR株式会社 | 2024-12-03 | — | — | CN | disclosed |
| CN-118795734-A | Radiation-sensitive composition, cured film, method for producing cured film, liquid crystal display device, and organic EL display device | JSR株式会社 | 2024-10-18 | — | — | CN | disclosed |
| US-12019369-B2 | Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device | FUJIFILM CORPORATION (JP) | 2024-06-25 | — | — | US | disclosed |
| US-20230367049-A1 | COLORED COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230312869-A1 | COLORED RESIN COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230312869-A1 | COLORED RESIN COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| EP-4219631-A1 | COLORING COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-02 | — | — | EP | disclosed |
| US-11693310-B2 | Blue curable resin composition, blue color filter, and display device including same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-07-04 | — | — | US | disclosed |
| US-11693310-B2 | Blue curable resin composition, blue color filter, and display device including same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-07-04 | — | — | US | disclosed |
| US-20230176421-A1 | DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-08 | — | — | US | disclosed |
| US-20170327631-A1 | CURABLE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9683150-B2 | Curable composition, adhesive, method of producing fiber-reinforced composite material, and fiber-reinforced composite material | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-20 | — | — | US | disclosed |
| US-20170160636-A1 | PHOTOSENSITIVE COMPOSITION AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-08 | — | — | US | disclosed |
| US-20150252229-A1 | CURABLE COMPOSITION, ADHESIVE, METHOD OF PRODUCING FIBER-REINFORCED COMPOSITE MATERIAL, AND FIBER-REINFORCED COMPOSITE MATERIAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-10 | — | — | US | disclosed |
| WO-2014208767-A1 | COLORED CURABLE RESIN COMPOSITION | 住友化学株式会社 (JP) | 2014-12-31 | — | — | WO | disclosed |
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| WO-2011018987-A1 | DISPLAY DEVICE | 住友化学株式会社 (JP) | 2011-02-17 | — | — | WO | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |