SCHEMBL12936751

SCHEMBL12936751

OCCCCCCCCCCCCCCN1CCSCC1

nearest known ligand 0.42

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 1/20 0.42
KDM1A O60341 2/20 0.39
PNMT P11086 1/20 0.35
ARG1 P05089 1/20 0.35
ARG2 P78540 1/20 0.35
PAOX Q6QHF9 1/20 0.34
GAA P10253 1/20 0.33
GNAI3 P08754 1/20 0.32
GNAO1 P09471 1/20 0.32
GNAI1 P63096 1/20 0.32
CXCR4 P61073 1/20 0.32
FAAH O00519 1/20 0.32
PHGDH O43175 1/20 0.32
MGLL Q99685 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12936758 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL5857741 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL12936745 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL12936760 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL5857565 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL12936748 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL12936744 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL12936756 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL12936743 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2
SCHEMBL12936753 1.00 HRH3 (0.42) HRH3KDM1APNMTARG1ARG2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846294-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-30 US disclosed
US-8846294-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-30 US disclosed
US-20120251946-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-04 US disclosed
US-20120251946-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-04 US disclosed