SCHEMBL13017151

SCHEMBL13017151

CC(C)(C)C(C)(C)CCCn1cnc2ccccc21

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.62
SMN1; SMN2 Q16637 8/20 0.55
LMNA P02545 6/20 0.55
TSHR P16473 2/20 0.55
ALOX15 P16050 1/20 0.55
HTT P42858 6/20 0.53
MAPT P10636 3/20 0.53
STAT3 P40763 1/20 0.53
MEN1 O00255 2/20 0.52
KMT2A Q03164 2/20 0.52
NPSR1 Q6W5P4 1/20 0.51
NPC1 O15118 1/20 0.51
NFKB1 P19838 1/20 0.51
RAB9A P51151 1/20 0.51
NFKB2 Q00653 1/20 0.51
RELA Q04206 1/20 0.51
EGLN3 Q9H6Z9 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
DRD2 P14416 1/20 0.49
DRD4 P21917 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13017124 0.88 TDP1 (0.66) TDP1SMN1; SMN2LMNATSHRALOX15
SCHEMBL13017125 0.82 TDP1 (0.58) TDP1SMN1; SMN2LMNATSHRALOX15
SCHEMBL9814242 0.82 TDP1 (0.84) TDP1SMN1; SMN2LMNATSHRALOX15
SCHEMBL3161153 0.82 TDP1 (0.84) TDP1SMN1; SMN2LMNATSHRALOX15
SCHEMBL30294105 0.82 TDP1 (0.84) TDP1SMN1; SMN2LMNATSHRALOX15
SCHEMBL28845828 0.81 TDP1 (0.66) TDP1SMN1; SMN2LMNATSHRALOX15
SCHEMBL13233290 0.81 TDP1 (0.70) TDP1SMN1; SMN2LMNATSHRALOX15
SCHEMBL352046 0.80 TDP1 (0.81) TDP1SMN1; SMN2LMNATSHRALOX15
SCHEMBL2331250 0.80 TDP1 (0.81) TDP1SMN1; SMN2LMNATSHRALOX15
Ammonia Solution, Strong SCHEMBL7100443 0.80 TDP1 (0.81) TDP1SMN1; SMN2LMNATSHRALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100330505-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING CYCLIC AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-30 US disclosed