SCHEMBL1304205

SCHEMBL1304205

CCCC(=O)C(CC)C(=O)[O-].CCCC(=O)C(CC)C(=O)[O-].[Cu+2]

nearest known ligand 0.46

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 3/20 0.46
HDAC3 O15379 3/20 0.46
HDAC1 Q13547 3/20 0.46
HDAC2 Q92769 3/20 0.46
HDAC8 Q9BY41 3/20 0.46
CES2 O00748 2/20 0.43
CES1 P23141 2/20 0.43
TSHR P16473 3/20 0.41
CYP3A4 P08684 2/20 0.41
NFKB1 P19838 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
CA2 P00918 3/20 0.39
CA1 P00915 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Zinc Ion SCHEMBL1961778 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL17433598 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL30364223 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL192692 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL8586807 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL16909330 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL610851 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL1304414 0.95 FFAR3 (0.50) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL17477084 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8
SCHEMBL17477093 0.95 FFAR3 (0.46) FFAR3HDAC3HDAC1HDAC2HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8053029-B2 Method for fabricating CuInS2 thin film by metal organic chemical vapor deposition, CuInS2 thin film fabricated by the same and method for fabricating In2S3 thin film therefrom SAMSUNG SDI CO., LTD. (KR) 2011-11-08 US claimed
US-20080012015-A1 METHOD FOR FABRICATING CuInS2 THIN FILM BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION, CuInS2 THIN FILM FABRICATED BY THE SAME AND METHOD FOR FABRICATING In2S3 THIN FILM THEREFROM SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-01-17 US claimed
US-8053029-B2 Method for fabricating CuInS2 thin film by metal organic chemical vapor deposition, CuInS2 thin film fabricated by the same and method for fabricating In2S3 thin film therefrom SAMSUNG SDI CO., LTD. (KR) 2011-11-08 US disclosed
US-20080012015-A1 METHOD FOR FABRICATING CuInS2 THIN FILM BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION, CuInS2 THIN FILM FABRICATED BY THE SAME AND METHOD FOR FABRICATING In2S3 THIN FILM THEREFROM SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-01-17 US disclosed