SCHEMBL1304516

SCHEMBL1304516

FC1=[C]CCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1304723 0.90
SCHEMBL6737899 0.61
SCHEMBL8993554 0.61
SCHEMBL17796894 0.60
SCHEMBL19952780 0.60
SCHEMBL343499 0.60
SCHEMBL9153126 0.60
SCHEMBL1822544 0.60
SCHEMBL291795 0.60
SCHEMBL10407 0.52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110225895-B Base protective film, adhesion preventing member, and method for forming adhesion preventing member 星和电机株式会社 2021-11-02 CN claimed
WO-2024116576-A1 RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID-GENERATING AGENT JSR株式会社 2024-06-06 WO disclosed
WO-2024116575-A1 RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND RADIATION-SENSITIVE ACID GENERATOR JSR株式会社 2024-06-06 WO disclosed
WO-2024116577-A1 RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATOR JSR株式会社 2024-06-06 WO disclosed
EP-4370206-A1 ESTERS OF 7-COOH CBD DERIVATIVES AND THEIR USE AS PREVENTION, PROPHYLAXIS OF PROGRESSION, AND/OR TREATMENT OF NEUROGENERATIVE DISEASES Receptorpharma Inc S-Corp (US) 2024-05-22 EP disclosed
WO-2024057751-A1 RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR株式会社 2024-03-21 WO disclosed
US-20240004297-A1 COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE JSR CORPORATION (JP) 2024-01-04 US disclosed
US-20230400765-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND JSR CORPORATION (JP) 2023-12-14 US disclosed
CN-117143121-A Compounds and uses thereof 华为技术有限公司 2023-12-01 CN disclosed
WO-2023228847-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR株式会社 2023-11-30 WO disclosed
US-6492362-B1 Compounds and compositions as cathepsin S inhibitors AXYS PHARMACEUTICALS, INC. 2002-12-10 US disclosed
EP-1212302-A1 COMPOUNDS AND PHARMACEUTICAL COMPOSITIONS AS CATHEPSIN S INHIBITORS AXYS PHARMACEUTICALS, INC. (US) 2002-06-12 EP disclosed
WO-2001019796-A1 COMPOUNDS AND PHARMACEUTICAL COMPOSITIONS AS CATHEPSIN S INHIBITORS AXYS PHARMACEUTICALS, INC. (US) 2001-03-22 WO disclosed
US-5234946-A Anticholesterol, antilipemic BANYU PHARMACEUTICAL CO., LTD. (JP) 1993-08-10 US disclosed
EP-0318860-B1 SUBSTITUTED ALKYLAMINE DERIVATIVES BANYU PHARMACEUTICAL CO., LTD. (JP) 1993-06-16 EP disclosed
EP-0317911-B1 PROCESS FOR THE PREPARATION OF PHENYL ACETALDEHYDES BASF Aktiengesellschaft (DE) 1993-06-09 EP disclosed
US-4990684-A Heating a glycidic ester in the presence of a zeolite or supported metal, phosphorous or boric oxides BASF AKTIENGESELLSCHAFT (DE) 1991-02-05 US disclosed
CN-1037141-A The alkylamine derivative that replaces BANYU PHARMA CO LTD (JP) 1989-11-15 CN disclosed
EP-0318860-A2 Substituted alkylamine derivatives BANYU PHARMACEUTICAL CO., LTD. (JP) 1989-06-07 EP disclosed
EP-0317911-A2 Process for the preparation of phenyl acetaldehydes BASF Aktiengesellschaft (DE) 1989-05-31 EP disclosed