SCHEMBL1304600

SCHEMBL1304600

C=CCC#C/C(C)=C/CC=C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1304601 1.00
SCHEMBL11369530 0.73 TSHR (0.34)
SCHEMBL11369533 0.73 TSHR (0.34)
SCHEMBL3263741 0.71
SCHEMBL11368627 0.69 TSHR (0.47)
SCHEMBL117779 0.67
SCHEMBL1305942 0.66
Ammonia Solution, Strong SCHEMBL28418701 0.65
SCHEMBL27786415 0.65
SCHEMBL1305239 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7012120-B2 Reworkable compositions of oxirane(s) or thirane(s)-containing resin and curing agent HENKEL CORPORATION (US) 2006-03-14 US claimed
US-20050288458-A1 Reworkable thermosetting resin composition KLEMARCZYK PHILIP T 2005-12-29 US claimed
US-20030073770-A1 Reworkable compositions of oxirane(s) or thirane(s)-containing resin and curing agent Henkel IP & Holding GmbH (DE) 2003-04-17 US claimed
US-8053587-B2 for mounting onto a circuit board semiconductor devices HENKEL CORPORATION (US) 2011-11-08 US disclosed
US-20080214840-A1 Reworkable thermosetting resin composition HENKEL CORPORATION (US) 2008-09-04 US disclosed
US-7012120-B2 Reworkable compositions of oxirane(s) or thirane(s)-containing resin and curing agent HENKEL CORPORATION (US) 2006-03-14 US disclosed
US-20050288458-A1 Reworkable thermosetting resin composition KLEMARCZYK PHILIP T 2005-12-29 US disclosed
US-20030073770-A1 Reworkable compositions of oxirane(s) or thirane(s)-containing resin and curing agent Henkel IP & Holding GmbH (DE) 2003-04-17 US disclosed
US-4289659-A CYCLOHEXANE DERIVATIVES FIRMENICH SA (CH) 1981-09-15 US disclosed
US-4264467-A Cyclic C6 compounds and their use in perfumes FIRMENICH SA (CH) 1981-04-28 US disclosed
US-4147672-A Cyclic C6 ketones in perfumes FIRMENICH SA (CH) 1979-04-03 US disclosed