⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27571566 | 0.74 | — | — | |
| Glyoxylate SCHEMBL28565486 | 0.70 | CA1 (0.36) | — | |
| Glyoxylate SCHEMBL1518069 | 0.67 | TSHR (0.50) | — | |
| Bicarbonate SCHEMBL10451074 | 0.67 | CA1 (0.56) | — | |
| Glyoxylate SCHEMBL15868 | 0.67 | — | — | |
| Bicarbonate SCHEMBL5154473 | 0.67 | — | — | |
| SCHEMBL29713 | 0.67 | — | — | |
| SCHEMBL278814 | 0.67 | — | — | |
| Glyoxylate SCHEMBL11690306 | 0.67 | TSHR (0.50) | — | |
| SCHEMBL6572606 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117887354-A | Coating for anti-frosting coating, preparation method and application | 广州慧谷新材料科技股份有限公司 | 2024-04-16 | — | — | CN | claimed |
| US-9963544-B2 | Active ester resin containing phosphorus atom, epoxy resin composition and cured product thereof, prepreg, circuit board, and build-up film | DIC CORPORATION (JP) | 2018-05-08 | — | — | US | claimed |
| US-20160130391-A1 | ACTIVE ESTER RESIN CONTAINING PHOSPHORUS ATOM, EPOXY RESIN COMPOSITION AND CURED PRODUCT THEREOF, PREPREG, CIRCUIT BOARD, AND BUILD-UP FILM | DIC CORPORATION (JP) | 2016-05-12 | — | — | US | claimed |
| US-20150344617-A1 | ACTIVE ESTER RESIN, EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, PREPREG, CIRCUIT BOARD, AND BUILD-UP FILM | DIC CORPORATION (JP) | 2015-12-03 | — | — | US | claimed |
| EP-1306372-B1 | HETEROCYCLE DERIVATIVES AND DRUGS | NIPPON SHINYAKU CO LTD (JP) | 2009-11-18 | — | — | EP | claimed |
| US-6908719-B1 | Photosensitive compound and photosensitive composition | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2005-06-21 | — | — | US | claimed |
| US-6177228-B1 | COMPRISING A RADIATION-SENSITIVE ACID GENERATOR AND A POLYMER COMPRISING THE REACTION PRODUCT OF A MONOMER SELECTED FROM METHACRYLATE OR ACRYLATE HAVING A PHOTOACID CLEAVABLE ESTER SUBSTITUENT AND AN UNSATURATED ESTER MONOMER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-01-23 | — | — | US | claimed |
| US-6107184-A | REACTING THE CONDENSED P-XYLYLENE AND A VINYL COMONOMER AT A TEMPERATURE THAT RETAINS LABILE GROUPS IN A CONFORMAL COPOLYMER LAYER, AND CURING THE COPOLYMER TO CONVERT LABILE GROUPS TO DISPERSE GAS BUBBLES | APPLIED MATERIALS, INC. (US) | 2000-08-22 | — | — | US | claimed |
| EP-1018527-A2 | Nano-porous copolymer films having low dielectric constants | Applied Materials, Inc. (US) | 2000-07-12 | — | — | EP | claimed |
| JP-10166317-A | — | — | None | — | — | JP | disclosed |
| JP-10166316-A | — | — | None | — | — | JP | disclosed |
| CN-117887354-A | Coating for anti-frosting coating, preparation method and application | 广州慧谷新材料科技股份有限公司 | 2024-04-16 | — | — | CN | disclosed |
| CN-117024681-A | Synthesis method of active ester curing agent | 东营市赫邦化工有限公司 | 2023-11-10 | — | — | CN | disclosed |
| US-10059798-B2 | Active ester resin, epoxy resin composition, cured product thereof, prepreg, circuit board, and build-up film | DIC CORPORATION (JP) | 2018-08-28 | — | — | US | disclosed |
| US-4533730-A | BACTERICIDES | SHIONOGI & CO., LTD. (JP) | 1985-08-06 | — | — | US | disclosed |
| US-4504659-A | 1-Oxadethiacepham compounds | SHIONOGI & CO., LTD. (JP) | 1985-03-12 | — | — | US | disclosed |
| US-4478997-A | 1-Oxadethiacepham compounds | SHIONOGI & CO., LTD. (JP) | 1984-10-23 | — | — | US | disclosed |
| US-4443598-A | ANTIBIOTICS AND INTERMEDIATES | SHIONOGI & CO., LTD. (JP) | 1984-04-17 | — | — | US | disclosed |
| US-4366316-A | FROM OXAZOLINOAZETIDINONE AND ACID | SHIONOGI & CO., LTD. (JP) | 1982-12-28 | — | — | US | disclosed |
| US-4205082-A | ANTI-ALLERGIC AGENTS | CIBA-GEIGY CORPORATION (US) | 1980-05-27 | — | — | US | disclosed |