⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8090475 | 0.80 | — | — | |
| SCHEMBL7924814 | 0.75 | — | — | |
| SCHEMBL7925564 | 0.74 | — | — | |
| SCHEMBL7752000 | 0.73 | — | — | |
| SCHEMBL16819064 | 0.72 | — | — | |
| SCHEMBL16819034 | 0.72 | — | — | |
| SCHEMBL17092181 | 0.72 | — | — | |
| SCHEMBL5074142 | 0.71 | — | — | |
| SCHEMBL8090434 | 0.71 | — | — | |
| SCHEMBL7924772 | 0.70 | ELANE (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3178808-B1 | ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM FORMATION METHOD AND ALCOHOL COMPOUND | ADEKA CORP (JP) | 2024-11-06 | — | — | EP | disclosed |
| US-11618762-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2023-04-04 | — | — | US | disclosed |
| US-20220017554-A1 | COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND AMIDINE COMPOUND | ADEKA CORPORATION (JP) | 2022-01-20 | — | — | US | disclosed |
| US-11161867-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2021-11-02 | — | — | US | disclosed |
| EP-3505511-B1 | DIAZADIENYL COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2021-05-26 | — | — | EP | disclosed |
| US-10920313-B2 | Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film | ADEKA CORPORATION (JP) | 2021-02-16 | — | — | US | disclosed |
| US-10882874-B2 | Vanadium compound | ADEKA CORPORATION (JP) | 2021-01-05 | — | — | US | disclosed |
| US-10822351-B2 | Heterocycle-substituted bicyclic azole pesticides | FMC CORPORATION (US) | 2020-11-03 | — | — | US | disclosed |
| EP-3476827-B1 | VANADIUM COMPOUND, STARTING MATERIAL FOR THIN FILM FORMATION, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2020-09-16 | — | — | EP | disclosed |
| US-10651031-B2 | Tantalum compound | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2020-05-12 | — | — | US | disclosed |
| EP-2940025-A1 | ALUMINUM COMPOUND, THIN FILM-FORMING RAW MATERIAL, AND METHOD FOR PRODUCING THIN FILM | Adeka Corporation (JP) | 2015-11-04 | — | — | EP | disclosed |
| US-20150266904-A1 | ALUMINUM COMPOUND, THIN-FIRM FORMING RAW MATERIAL, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORPORATION (JP) | 2015-09-24 | — | — | US | disclosed |
| EP-2921472-A1 | METAL ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND | Adeka Corporation (JP) | 2015-09-23 | — | — | EP | disclosed |
| CN-104755485-A | Aluminum compound, thin film-forming raw material, and method for producing thin film | ADEKA CORP | 2015-07-01 | — | — | CN | disclosed |
| US-20150175642-A1 | METAL ALKOXIDE COMPOUND, THIN-FILM-FORMING MATERIAL, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND | ADEKA CORPORATION (JP) | 2015-06-25 | — | — | US | disclosed |
| CN-104470892-A | Metal alkoxide compound, thin film-forming starting material, method for producing thin film, and alcohol compound | ADEKA CORP | 2015-03-25 | — | — | CN | disclosed |
| US-8853075-B2 | Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2014-10-07 | — | — | US | disclosed |
| US-20110275215-A1 | METHOD FOR FORMING A TITANIUM-CONTAINING LAYER ON A SUBSTRATE USING AN ATOMIC LAYER DEPOSITION (ALD) PROCESS | L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2011-11-10 | — | — | US | disclosed |
| EP-2257561-A1 | METHOD FOR FORMING A TITANIUM-CONTAINING LAYER ON A SUBSTRATE USING AN ATOMIC LAYER DEPOSITION (ALD) PROCESS | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2010-12-08 | — | — | EP | disclosed |
| WO-2009106433-A1 | METHOD FOR FORMING A TITANIUM-CONTAINING LAYER ON A SUBSTRATE USING AN ATOMIC LAYER DEPOSITION (ALD) PROCESS | L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2009-09-03 | — | — | WO | disclosed |