SCHEMBL13110348

SCHEMBL13110348

O=C=NCCCCCCn1c(=O)n(CCCCCCN=C=O)c(=O)n(CCCCCN=C=O)c1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27177164 1.00
SCHEMBL27193056 1.00
SCHEMBL86400 1.00
SCHEMBL23458559 1.00
SCHEMBL27181892 1.00
SCHEMBL23350769 1.00
SCHEMBL18820203 1.00
SCHEMBL18020188 1.00
SCHEMBL20782902 1.00
SCHEMBL4382613 0.98

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991941-B UV-curable resin composition for hard coating applications 杜邦电子公司 2024-07-19 CN disclosed
US-12024640-B2 UV-curing resin compositions for hard coat applications Dupont Electronics Inc. (US) 2024-07-02 US disclosed
CN-115991941-A UV-curable resin composition for hard coating applications 杜邦电子公司 2023-04-21 CN disclosed
US-20230124713-A1 UV-CURING RESIN COMPOSITIONS FOR HARD COAT APPLICATIONS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-04-20 US disclosed
US-8735528-B1 Two-photon absorbing cross-linked polyurethanes containing diphenylamino-dialkylfluorene-1,3,5-triazine units THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 2014-05-27 US disclosed
US-20100267892-A1 ISOCYANATE TERMINATED POLYTRIMETHYLENE ETHER POLYOL AND PROCESS FOR MAKING SAME AXALTA COATING SYSTEMS IP CO. LLC (FORMERLY KNOWN AS U.S. COATINGS IP CO. LLC) 2010-10-21 US disclosed
WO-2009064821-A1 ISOCYANATE TERMINATED POLYTRIMETHYLENE ETHER POLYOL AND PROCESS FOR MAKING SAME E. I. DU PONT DE NEMOURS AND COMPANY (US) 2009-05-22 WO disclosed