SCHEMBL13130985

SCHEMBL13130985

O=C1OCCCC1Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DDB1 Q16531 1/20 0.35
CRBN Q96SW2 1/20 0.35
KDM4E B2RXH2 5/20 0.33
TSHR P16473 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
CYP1A2 P05177 2/20 0.32
ALDH1A1 P00352 3/20 0.31
POLB P06746 3/20 0.31
HPGD P15428 3/20 0.31
MAPT P10636 2/20 0.31
CYP2C19 P33261 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HSD17B10 Q99714 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31
GAA P10253 1/20 0.31
NPC1 O15118 1/20 0.30
TP53 P04637 1/20 0.30
RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13131055 1.00 DDB1 (0.35) DDB1CRBNKDM4ETSHRMEN1
SCHEMBL13131086 0.94 SMN1; SMN2 (0.33) KDM4ETSHRALDH1A1POLBSMN1; SMN2
SCHEMBL12996674 0.92 KDM4E (0.39) DDB1CRBNKDM4ETSHRMEN1
SCHEMBL13131079 0.92 KDM4E (0.39) DDB1CRBNKDM4ETSHRMEN1
SCHEMBL13130993 0.88 EPHX2 (0.33) KDM4ETSHRMEN1KMT2AALDH1A1
SCHEMBL13163191 0.85 KDM4E (0.38) KDM4ETSHRMEN1KMT2ACYP1A2
SCHEMBL13131091 0.85 POLB (0.38) KDM4ETSHRMEN1KMT2AALDH1A1
SCHEMBL13163198 0.82 KDM4E (0.34) DDB1CRBNKDM4ETSHRMEN1
SCHEMBL13131084 0.82 DDB1 (0.36) DDB1CRBNKDM4ETSHRMEN1
SCHEMBL13163205 0.80 KDM4E (0.38) KDM4ETSHRMEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895222-B2 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-11-25 US disclosed
US-8404427-B2 Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition FUJIFILM CORPORATION (JP) 2013-03-26 US disclosed
US-20100248149-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed
US-20100239978-A1 PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST FILM USING THE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-09-23 US disclosed
US-7749679-B2 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition FUJIFILM CORPORATION (JP) 2010-07-06 US disclosed
US-20070148592-A1 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition FUJIFILM CORPORATION (JP) 2007-06-28 US disclosed