Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13829226 | 0.82 | HMGCR (0.37) | HMGCR | |
| SCHEMBL13201518 | 0.81 | HMGCR (0.35) | HMGCR | |
| SCHEMBL17465460 | 0.79 | HMGCR (0.32) | HMGCR | |
| SCHEMBL13430234 | 0.77 | HMGCR (0.36) | HMGCR | |
| SCHEMBL13829227 | 0.77 | HMGCR (0.39) | HMGCR | |
| SCHEMBL13219628 | 0.77 | SLCO1B1 (0.31) | — | |
| SCHEMBL20101400 | 0.77 | HMGCR (0.33) | HMGCR | |
| SCHEMBL25701420 | 0.76 | HMGCR (0.34) | HMGCR | |
| SCHEMBL132135 | 0.76 | SLCO1B1 (0.31) | — | |
| SCHEMBL27052521 | 0.76 | CHRM1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7771913-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20070231738-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |