⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28382808 | 0.95 | — | — | |
| Ammonia Solution, Strong SCHEMBL28212856 | 0.95 | — | — | |
| SCHEMBL27661548 | 0.95 | — | — | |
| SCHEMBL28187198 | 0.95 | — | — | |
| Hydrochloric Acid SCHEMBL28401752 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL28173373 | 0.91 | — | — | |
| Hydrochloric Acid SCHEMBL27681777 | 0.91 | — | — | |
| Tert-Butylamine SCHEMBL1690824 | 0.87 | — | — | |
| SCHEMBL28401751 | 0.83 | — | — | |
| SCHEMBL27681776 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 830 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260136856-A1 | METHOD AND SYSTEM FOR FORMING SILICON NITRIDE ON A SIDEWALL OF A FEATURE | ASM IP HOLDING BV (NL) | 2026-05-14 | — | — | US | claimed |
| US-12550644-B2 | Method and system for forming silicon nitride on a sidewall of a feature | ASM IP HOLDING B.V. (NL) | 2026-02-10 | — | — | US | claimed |
| CN-115515998-B | Synthesis of polyurethanes by chain growth copolymerization | 伊夫·雅努 | 2025-06-24 | — | — | CN | claimed |
| US-20250197709-A1 | HIGH TEMPERATURE HIGH SALT LOW END RHEOLOGY MODIFIERS | CNPC USA CORPORATION (US) | 2025-06-19 | — | — | US | claimed |
| US-12241016-B2 | High temperature high salt low end rheology modifiers | CNPC USA CORPORATION (US) | 2025-03-04 | — | — | US | claimed |
| US-20240166774-A1 | METHOD FOR PREPARING SUPPORTED OLEFIN POLYMERIZATION CATALYST, RESULTING CATALYST AND APPLICATION THEREOF | ZHEJIANG UNIVERSITY (CN) | 2024-05-23 | — | — | US | claimed |
| WO-2024035439-A1 | HIGH TEMPERATURE HIGH SALT LOW END RHEOLOGY MODIFIERS | CNPC USA CORPORATION (US) | 2024-02-15 | — | — | WO | claimed |
| US-20240043734-A1 | HIGH TEMPERATURE HIGH SALT LOW END RHEOLOGY MODIFIERS | CNPC USA CORPORATION (US) | 2024-02-08 | — | — | US | claimed |
| EP-4273177-A1 | METHOD FOR PREPARING SUPPORTED OLEFIN POLYMERIZATION CATALYST, RESULTING CATALYST AND APPLICATION THEREOF | Zhejiang University (CN) | 2023-11-08 | — | — | EP | claimed |
| WO-2023152730-A1 | AMINE-BORANE ADDUCTS IN THE SYNTHESIS OF POLYESTER AND ITS COPOLYMERS USING CYCLIC ESTERS AND COMPOSITIONS THEREOF | KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY (SA) | 2023-08-17 | — | — | WO | claimed |
| US-20120114869-A1 | FILM FORMING METHOD | TOKYO ELECTRON LIMITED (JP) | 2012-05-10 | — | — | US | claimed |
| CN-102395705-A | Device and method for forming film | TOKYO ELECTRON LTD | 2012-03-28 | — | — | CN | claimed |
| US-8026150-B2 | Semiconductor device manufacturing method and storage medium | TOKYO ELECTRON LIMITED (JP) | 2011-09-27 | — | — | US | claimed |
| US-7799703-B2 | Processing method and storage medium | TOKYO ELECTRON LIMITED (JP) | 2010-09-21 | — | — | US | claimed |
| US-20100009546-A1 | Aminosilanes for Shallow Trench Isolation Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-01-14 | — | — | US | claimed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| US-20080311728-A1 | METHOD FOR RECOVERING DAMAGE OF LOW DIELECTRIC INSULATING FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TOKYO ELECTRON LIMITED (JP) | 2008-12-18 | — | — | US | claimed |
| US-20080194115-A1 | PROCESSING METHOD AND STORAGE MEDIUM | TOKYO ELECTON LIMITED (JP) | 2008-08-14 | — | — | US | claimed |
| US-20080090985-A1 | PROCESS FOR PRODUCING CONTROLLED VISCOSITY FLUOROSILICONE POLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-17 | — | — | US | claimed |
| US-20080090987-A1 | PROCESS FOR PRODUCING CONTROLLED VISCOSITY FLUOROSILICONE POLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-17 | — | — | US | claimed |