Fluoride

Fluoride

SCHEMBL132579

F.O[Si](O)(O)O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL28694596 1.00
Fluoride SCHEMBL28148204 1.00
Fluoride SCHEMBL1776832 1.00
Fluoride SCHEMBL15796527 1.00
Fluoride SCHEMBL11426308 0.91
Fluoride SCHEMBL11426305 0.91
Fluoride SCHEMBL2026736 0.91
Fluoride SCHEMBL7567635 0.91
Fluoride SCHEMBL4752881 0.91
Fluoride SCHEMBL5081682 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3852 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240345031-A1 PHOTOACOUSTIC MICROSCOPY PLATFORM ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY 2024-10-17 US claimed
US-20240153976-A1 IMAGE SENSOR AND ELECTRONIC SYSTEM INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-05-09 US claimed
US-20240055458-A1 IMAGE SENSOR AND ELECTRONIC SYSTEM INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-02-15 US claimed
CN-117447112-A High-adaptability alkali-free accelerator prepared from modified aluminum hydroxide and method thereof 贵州天威建材科技有限责任公司 2024-01-26 CN claimed
US-11728371-B2 Method of fabricating LED module SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-08-15 US claimed
WO-2023101290-A1 COMPOSITION FOR SURFACE-TREATING HOT-DIP GALVANIZED TERNARY STEEL SHEET HAVING EXCELLENT CORROSION RESISTANCE AND ANTI-BLACKENING PROPERTY, HOT-DIP GALVANIZED TERNARY STEEL SHEET SURFACE-TREATED USING SAME, AND METHOD FOR PRODUCING SAME 주식회사 포스코 2023-06-08 WO claimed
WO-2023101291-A1 COMPOSITION FOR TREATING SURFACE OF TERNARY HOT-DIP GALVANIZED STEEL SHEET HAVING EXCELLENT CORROSION RESISTANCE AND ENVIRONMENTAL STABILITY, TERNARY HOT-DIP GALVANIZED STEEL SHEET THAT IS SURFACE-TREATED USING SAME, AND METHOD FOR MANUFACTURING SAME 주식회사 포스코 2023-06-08 WO claimed
US-20230038881-A1 SEMICONDUCTOR DEVICE WITH BURIED GATE STRUCTURE SK Hynix Inc. (KR) 2023-02-09 US claimed
US-11521978-B2 Semiconductor device and method for fabricating the same NANYA TECHNOLOGY CORPORATION (TW) 2022-12-06 US claimed
CN-111170352-B Method for preparing rare earth fluoride particles by using fluorine-containing waste acid 包头稀土研究院 2022-11-29 CN claimed
EP-0391619-B1 Dental cements DEN MAT CORP (US) 1993-12-15 EP claimed
CN-1020268-C Preparation method of framework silicon-rich molecular sieve PETROCHEMICAL SCIENCE INST CHI (CN) 1993-04-14 CN claimed
CN-1065814-A Novel crystalline silicon-reinforced aluminas UOP INC (US) 1992-11-04 CN claimed
CN-1065112-A Petrochemical industry sand-fixed dust-proof, the method for building the road and building the room UNIV BEIJING (CN) 1992-10-07 CN claimed
CN-1046544-A Production has the method for layered material of the silicon dioxide film that contains organic colorant and the layered material of producing thus FLAT GLASS ASS OF JAPAN (JP) 1990-10-31 CN claimed
EP-0391619-A2 Dental cements DEN-MAT CORPORATION (US) 1990-10-10 EP claimed
CN-1009162-B METHOD FOR CLEANING FILTRATION SURFACE RHONE POULENC CHIMIE (FR) 1990-08-15 CN claimed
CN-87103421-A The purging method of filtering surface 1987-12-16 CN claimed
CN-86105595-A Produce the production method of the raw material calcium silicofluoride of Calcium Fluoride (Fluorspan) and pure fluosilicic acid 1987-01-21 CN claimed
CN-86101114-A Chemical treatment process for continuous reduction and removal of minerals contained in carbon structures 1986-08-13 CN claimed