SCHEMBL13265129

SCHEMBL13265129

CC(O)COC(=O)C1CC=CCC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MIF P14174 1/20 0.39
ADRB2 P07550 1/20 0.36
ADRB1 P08588 1/20 0.36
ADRB3 P13945 1/20 0.36
ALDH1A1 P00352 5/20 0.35
MAPT P10636 2/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
ALOX15 P16050 1/20 0.35
HTT P42858 1/20 0.35
ESR2 Q92731 1/20 0.35
HSD17B10 Q99714 1/20 0.35
TDP1 Q9NUW8 3/20 0.34
SMN1; SMN2 Q16637 2/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CA14 Q9ULX7 1/20 0.32
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4757626 0.89 MIF (0.40) MIFADRB2ADRB1ADRB3ALDH1A1
SCHEMBL25988750 0.86 MIF (0.38) MIFADRB2ADRB1ADRB3ALDH1A1
SCHEMBL22036029 0.84 MIF (0.37) MIFADRB2ADRB1ADRB3ALDH1A1
SCHEMBL7694728 0.81 MIF (0.39) MIFADRB2ADRB1ADRB3ALDH1A1
SCHEMBL7904270 0.80 MIF (0.34) MIFALDH1A1MAPTMEN1KMT2A
SCHEMBL472121 0.80 MAPT (0.44) MIFALDH1A1MAPTMEN1KMT2A
SCHEMBL25648750 0.80 MAPT (0.44) MIFALDH1A1MAPTMEN1KMT2A
SCHEMBL29084231 0.80 MAPT (0.44) MIFALDH1A1MAPTMEN1KMT2A
SCHEMBL13649853 0.79 PPARG (0.40) MIFALDH1A1MAPTMEN1KMT2A
SCHEMBL17862134 0.79 MIF (0.44) MIFALDH1A1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7763412-B2 Polymer, positive resist composition and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-07-27 US disclosed
US-20080063975-A1 Polymer, Positive Resist Composition and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD (JP) 2008-03-13 US disclosed