Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.43 |
| ▸ | PRKCA | P17252 | 3/20 | 0.37 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.37 |
| ▸ | CTSK | P43235 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10187198 | 0.95 | TSHR (0.42) | TSHRPRKCAPRKCDCTSKMAPK1 | |
| SCHEMBL1577727 | 0.93 | TSHR (0.48) | TSHRPRKCAPRKCDCTSKMAPK1 | |
| SCHEMBL1759349 | 0.93 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL31757150 | 0.91 | TSHR (0.47) | TSHRPRKCAPRKCDCTSKMAPK1 | |
| SCHEMBL17222845 | 0.90 | TSHR (0.49) | TSHRPRKCAMAPK1MAPTALDH1A1 | |
| SCHEMBL7179762 | 0.90 | TSHR (0.47) | TSHRPRKCAMAPK1MAPTCA1 | |
| SCHEMBL1692337 | 0.89 | TSHR (0.46) | TSHRPRKCAPRKCDCTSKMAPK1 | |
| SCHEMBL1493259 | 0.89 | TSHR (0.50) | TSHRPRKCAPRKCDCTSKMAPK1 | |
| Methacrylic Acid SCHEMBL28825177 | 0.89 | TSHR (0.44) | TSHRPRKCAPRKCDCTSKMAPK1 | |
| SCHEMBL28270472 | 0.88 | TSHR (0.39) | TSHRPRKCAPRKCDCTSKMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-7741015-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-22 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080199806-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-08-21 | — | — | US | disclosed |