SCHEMBL13360993

SCHEMBL13360993

CC(C)(C)CC1(C(=O)OC2C3CC4OC(=O)C2C4C3)CC1(C)C

nearest known ligand 0.36

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.36
MEN1 O00255 2/20 0.36
L3MBTL1 Q9Y468 1/20 0.35
NPC1 O15118 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
ALDH1A1 P00352 2/20 0.33
TP53 P04637 1/20 0.33
RAB9A P51151 1/20 0.33
MAPT P10636 1/20 0.32
TSHR P16473 1/20 0.32
KDM4E B2RXH2 1/20 0.31
POLB P06746 1/20 0.31
ADORA2B P29275 1/20 0.31
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13360994 0.80
SCHEMBL47519 0.74 KMT2A (0.38) KMT2AMEN1L3MBTL1NPC1SMN1; SMN2
SCHEMBL13360974 0.73
SCHEMBL11892814 0.73
SCHEMBL13360973 0.72
SCHEMBL13360975 0.72
SCHEMBL13360995 0.72
SCHEMBL13360996 0.72
SCHEMBL13360972 0.71
SCHEMBL13360998 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100124718-A1 POLYMERIC COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESITS PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2010-05-20 US disclosed