SCHEMBL1336595

SCHEMBL1336595

CCCCC(CC)COC(=O)CCC(=O)OCC(CC)CCCC.[NaH]

nearest known ligand 0.86

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.86
TSHR P16473 3/20 0.86
ATM Q13315 1/20 0.86
TDP1 Q9NUW8 1/20 0.86
RECQL P46063 1/20 0.60
ALDH1A1 P00352 6/20 0.55
CA2 P00918 3/20 0.55
LMNA P02545 3/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
MAPK1 P28482 2/20 0.49
HSD17B10 Q99714 1/20 0.49
PRSS1 P07477 1/20 0.49
PRSS2 P07478 1/20 0.49
PRSS3 P35030 1/20 0.49
MAPT P10636 1/20 0.47
KDM4E B2RXH2 1/20 0.45
DUSP3 P51452 1/20 0.45
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28043105 1.00 CYP3A4 (0.86) CYP3A4TSHRATMTDP1RECQL
SCHEMBL44320 0.98 CYP3A4 (0.89) CYP3A4TSHRATMTDP1RECQL
SCHEMBL29361368 0.96 CYP3A4 (0.86) CYP3A4TSHRATMTDP1RECQL
SCHEMBL6014128 0.96 CYP3A4 (0.86) CYP3A4TSHRATMTDP1RECQL
Ammonia Solution, Strong SCHEMBL16192512 0.96 CYP3A4 (0.86) CYP3A4TSHRATMTDP1RECQL
Calcium SCHEMBL31454404 0.96 CYP3A4 (0.86) CYP3A4TSHRATMTDP1RECQL
SCHEMBL29543483 0.96 CYP3A4 (0.86) CYP3A4TSHRATMTDP1RECQL
SCHEMBL31338802 0.96 CYP3A4 (0.86) CYP3A4TSHRATMTDP1RECQL
Magnesium SCHEMBL31454400 0.96 CYP3A4 (0.86) CYP3A4TSHRATMTDP1RECQL
Alcohol SCHEMBL29133988 0.95 CYP3A4 (0.83) CYP3A4TSHRATMTDP1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025060517-A1 CEMENT-BASED SENSING MATERIAL, PREPARATION METHOD THEREFOR, AND USE THEREOF 中国长江电力股份有限公司 2025-03-27 WO claimed
US-20250074784-A1 Preparation Method of Spindle-shaped W@CuO Material with Adjustable Included Angle ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY (CN) 2025-03-06 US claimed
WO-2024254736-A1 PRUSSIAN BLUE POSITIVE ELECTRODE MATERIAL AND PREPARATION METHOD THEREFOR, AND PRUSSIAN BLUE POSITIVE ELECTRODE SHEET 广东邦普循环科技有限公司 2024-12-19 WO claimed
WO-2025060517-A1 CEMENT-BASED SENSING MATERIAL, PREPARATION METHOD THEREFOR, AND USE THEREOF 中国长江电力股份有限公司 2025-03-27 WO disclosed
US-20250074784-A1 Preparation Method of Spindle-shaped W@CuO Material with Adjustable Included Angle ZHENGZHOU UNIVERSITY OF LIGHT INDUSTRY (CN) 2025-03-06 US disclosed
WO-2024254736-A1 PRUSSIAN BLUE POSITIVE ELECTRODE MATERIAL AND PREPARATION METHOD THEREFOR, AND PRUSSIAN BLUE POSITIVE ELECTRODE SHEET 广东邦普循环科技有限公司 2024-12-19 WO disclosed
CN-117154125-A Gas diffusion layer, membrane electrode, fuel cell and automobile 一汽解放汽车有限公司 2023-12-01 CN disclosed
EP-3925695-A1 SURFACTANT COMPOSITION Kao Corporation (JP) 2021-12-22 EP disclosed
EP-3925696-A1 SURFACTANT COMPOSITION Kao Corporation (JP) 2021-12-22 EP disclosed
CN-110914471-A Composition for electroless plating base film formation 出光兴产株式会社 2020-03-24 CN disclosed
US-8846271-B2 Electrode material NISSAN MOTOR CO., LTD. (JP) 2014-09-30 US disclosed
US-20050075240-A1 Electrode catalyst for fuel cell and method for production thereof NISSAN MOTOR CO., LTD. 2005-04-07 US disclosed
US-20050003959-A1 Electrocatalyst and method of manufacturing the same NISSAN MOTOR CO., LTD. 2005-01-06 US disclosed
EP-1494304-A1 Electrocatalyst and method of manufacturing the same NISSAN MOTOR CO., LTD. (JP) 2005-01-05 EP disclosed
US-H1450-H Support with blue-sensitive silver halide emulsion layer comprising mixture of two kinds of silver chloride or silver chlorobromide grains having different grain sizes, each sensitized with blue-sensitizing dye; stable gradation KONICA CORPORATION (JP) 1995-06-06 US disclosed
EP-0589694-A1 Silver halide light-sensitive photographic material KONICA CORPORATION (JP) 1994-03-30 EP disclosed
US-5200296-A Support coated w/ an image receiving layer than an upper layer wherein physical development nuclei are distributed densely at surface of support & diminishing towards upper layer, & toner is dense in upper layer & diminishes towards support surface MITSUBISHI PAPER MILLS LIMITED (JP) 1993-04-06 US disclosed
US-4191623-A DOPE, POLYMER, COAGULATION WITH ELECTRIC CURRENT HONNY CHEMICALS COMPANY, LIMITED (JP) 1980-03-04 US disclosed
US-4145266-A SIMULATED LEATHER MATERIALS AND ELECTROLYTIC PROCESS FOR MAKING THEM HONNY CHEMICALS CO., LTD. (JP) 1979-03-20 US disclosed
US-3938999-A SURFACE ACTIVE ADDITION COPOLYMER FUJI PHOTO FILM CO., LTD. (JA) 1976-02-17 US disclosed