SCHEMBL13379656

SCHEMBL13379656

Oc1ccc(C2(c3ccc(O)cc3)CCCCCCCCCCCCCCCCC2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 7/20 1.00
ESR1 P03372 5/20 1.00
ALDH1A1 P00352 3/20 0.60
L3MBTL1 Q9Y468 1/20 0.60
ACHE P22303 1/20 0.48
LMNA P02545 3/20 0.47
MAPT P10636 2/20 0.47
ALOX12 P18054 2/20 0.47
HTT P42858 1/20 0.47
PSMB1 P20618 1/20 0.41
PSMB5 P28074 1/20 0.41
PSMB2 P49721 1/20 0.41
HSD17B10 Q99714 2/20 0.40
KDM4E B2RXH2 1/20 0.40
MEN1 O00255 1/20 0.40
NPC1 O15118 1/20 0.40
CA12 O43570 1/20 0.40
GMNN O75496 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11154712 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL269110 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL2131572 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL13379657 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL2132163 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL2131554 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL13379654 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL13379655 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL10777847 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE
SCHEMBL18773 1.00 ESR2 (1.00) ESR2ESR1ALDH1A1L3MBTL1ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8338078-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-25 US disclosed
US-20100104977-A1 PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-29 US disclosed