SCHEMBL13413769

SCHEMBL13413769

C=C1CCCC(CO)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31267718 0.86 — —
SCHEMBL23280791 0.77 — —
SCHEMBL8049843 0.75 — —
SCHEMBL9207187 0.73 — —
SCHEMBL3437926 0.73 — —
SCHEMBL3019153 0.70 — —
SCHEMBL24289082 0.70 — —
SCHEMBL23343541 0.70 — —
SCHEMBL171584 0.69 — —
SCHEMBL910074 0.69 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4688743-A1 INHIBITORS OF SPINSTER HOMOLOG 2 (SPNS2) FOR USE IN THERAPY University of Virginia Patent Foundation (US) 2026-02-11 — — EP disclosed
WO-2024206153-A1 INHIBITORS OF SPINSTER HOMOLOG 2 (SPNS2) FOR USE IN THERAPY UNIVERSITY OF VIRGINIA PATENT FOUNDATION (US) 2024-10-03 — — WO disclosed
US-20100102321-A1 RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-04-29 — — US disclosed
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