⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10184566 | 1.00 | — | — | |
| SCHEMBL334889 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL11157496 | 0.97 | — | — | |
| SCHEMBL13212384 | 0.71 | — | — | |
| SCHEMBL10278983 | 0.71 | — | — | |
| SCHEMBL12227015 | 0.69 | — | — | |
| SCHEMBL12864240 | 0.69 | — | — | |
| SCHEMBL12974331 | 0.69 | — | — | |
| SCHEMBL20295208 | 0.69 | CYP2D6 (1.00) | — | |
| SCHEMBL1343980 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8062429-B2 | Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions | EKC TECHNOLOGY, INC. (US) | 2011-11-22 | — | — | US | claimed |
| EP-2207872-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | EKC Technology, INC. (US) | 2010-07-21 | — | — | EP | claimed |
| EP-2207750-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC Technology, INC. (US) | 2010-07-21 | — | — | EP | claimed |
| US-20100043823-A1 | METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2010-02-25 | — | — | US | claimed |
| US-20090130849-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. | 2009-05-21 | — | — | US | claimed |
| WO-2009058274-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | claimed |
| WO-2009058273-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | claimed |
| WO-2009058278-A1 | METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMPOSITIONS | EKC TECHNOLOGY, INC (US) | 2009-05-07 | — | — | WO | claimed |
| WO-2009058277-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | claimed |
| US-20090112024-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | claimed |
| US-20090111965-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | claimed |
| US-20170355712-A1 | AMINE-SUBSTITUTED ARYL OR HETEROARYL COMPOUNDS | Epizyme, Inc. | 2017-12-14 | — | — | US | disclosed |
| US-20170355712-A1 | AMINE-SUBSTITUTED ARYL OR HETEROARYL COMPOUNDS | Epizyme, Inc. | 2017-12-14 | — | — | US | disclosed |
| WO-2017181177-A1 | AMINE-SUBSTITUTED ARYL OR HETEROARYL COMPOUNDS AS EHMT1 AND EHMT2 INHIBITORS | Epizyme, Inc. (US) | 2017-10-19 | — | — | WO | disclosed |
| EP-2585458-B1 | Alkaloid aminoester derivatives and medicinal compositions thereof | CHIESI FARMA SPA (IT) | 2015-01-07 | — | — | EP | disclosed |
| WO-2009058274-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058273-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058275-A1 | METHODS OF POST CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING USING AMIDOXIME COMPOSITIONS | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| US-20090112024-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | disclosed |
| US-20090111965-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | disclosed |