Hydrazine

Hydrazine

SCHEMBL1344263

NN.ONc1ccccc1

nearest known ligand 0.88

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.88
TDP1 Q9NUW8 3/20 0.50
CYP3A4 P08684 3/20 0.50
PTGS2 P35354 2/20 0.50
CYP1A2 P05177 2/20 0.50
CYP2C9 P11712 2/20 0.50
CYP2C19 P33261 2/20 0.50
LMNA P02545 1/20 0.50
CYP2D6 P10635 1/20 0.50
ALDH1A1 P00352 6/20 0.47
HSD17B10 Q99714 6/20 0.47
CTSD P07339 1/20 0.47
TSHR P16473 4/20 0.46
TAS2R38 P59533 3/20 0.46
TP53 P04637 2/20 0.46
TYR P14679 1/20 0.46
ALOX12 P18054 2/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
ALOX15 P16050 1/20 0.45
PTGS1 P23219 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydroxyamine SCHEMBL28084344 0.94 IDO1 (0.88) IDO1TDP1CYP3A4PTGS2CYP1A2
SCHEMBL98310 0.94
Hydroxyamine SCHEMBL27935320 0.91 IDO1 (0.82) IDO1TDP1CYP3A4PTGS2CYP1A2
SCHEMBL1244278 0.90
Ammonia Solution, Strong SCHEMBL5177854 0.90
SCHEMBL2531299 0.90
Lithium SCHEMBL29701325 0.90
SCHEMBL29494117 0.90
Hydrochloric Acid SCHEMBL874033 0.90
Water SCHEMBL27924856 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8303839-B2 Trioka acid semiconductor cleaning compositions and methods of use LASERWORT LTD (HK) 2012-11-06 US disclosed
US-8062429-B2 Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions EKC TECHNOLOGY, INC. (US) 2011-11-22 US disclosed
US-20110180747-A1 Trioka Acid Semiconductor Cleaning Compositions and Methods of Use LASERWORT LTD (HK) 2011-07-28 US disclosed
US-7947130-B2 Troika acid semiconductor cleaning compositions and methods of use LASERWORT LTD (HK) 2011-05-24 US disclosed
US-20110094536-A1 Troika Acid Semiconductor Cleaning Compositions and Methods of Use Lee, Wai Mun (US) 2011-04-28 US disclosed
US-20100043823-A1 METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2010-02-25 US disclosed
US-20090130849-A1 CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE EKC TECHNOLOGY, INC. 2009-05-21 US disclosed
WO-2009058274-A1 CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE EKC TECHNOLOGY, INC. (US) 2009-05-07 WO disclosed
WO-2009058288-A1 AMIDOXIME COMPOUNDS AS CHELATING AGENTS IN SEMICONDUCTOR PROCESSES EKC TECHNOLOGY, INC. (US) 2009-05-07 WO disclosed
WO-2009058278-A1 METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMPOSITIONS EKC TECHNOLOGY, INC (US) 2009-05-07 WO disclosed
US-20090107520-A1 AMIDOXIME COMPOUNDS AS CHELATING AGENTS IN SEMICONDUCTOR PROCESSES EKC TECHNOLOGY, INC. 2009-04-30 US disclosed