Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CXCR2 | P25025 | 1/20 | 0.34 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.33 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.33 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | KIF11 | P52732 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17999228 | 0.88 | PIK3CD (0.35) | CXCR2PIK3CDPIK3CAPIK3CBTDP1 | |
| SCHEMBL2742196 | 0.88 | PTPN1 (0.38) | CXCR2PIK3CDPIK3CAPIK3CBTDP1 | |
| SCHEMBL2742198 | 0.86 | PTPN1 (0.34) | — | |
| SCHEMBL15450646 | 0.85 | PIK3CD (0.32) | PIK3CDPIK3CAPIK3CB | |
| SCHEMBL15450638 | 0.82 | CXCR2 (0.38) | CXCR2PIK3CDPIK3CAPIK3CBKIF11 | |
| SCHEMBL683020 | 0.80 | PIK3CD (0.36) | PIK3CDPIK3CAPIK3CBTDP1KIF11 | |
| SCHEMBL940747 | 0.80 | PIK3CD (0.42) | PIK3CDPIK3CAPIK3CBTDP1KIF11 | |
| SCHEMBL683397 | 0.79 | TDP1 (0.42) | CXCR2PIK3CDPIK3CAPIK3CBTDP1 | |
| SCHEMBL17409277 | 0.79 | STS (0.40) | PIK3CDPIK3CAPIK3CBTDP1KIF11 | |
| SCHEMBL31019590 | 0.79 | PIK3CD (0.46) | PIK3CDPIK3CAPIK3CBTDP1KIF11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-8940476-B2 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | FUJIFILM CORPORATION (JP) | 2015-01-27 | — | — | US | disclosed |
| US-20120264054-A1 | PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-10-18 | — | — | US | disclosed |