⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL108229 | 0.91 | CYP4F2 (0.33) | — | |
| SCHEMBL10056785 | 0.86 | — | — | |
| SCHEMBL14723944 | 0.84 | — | — | |
| SCHEMBL12248966 | 0.83 | — | — | |
| SCHEMBL17264839 | 0.82 | — | — | |
| SCHEMBL111853 | 0.82 | CYP4F2 (0.33) | — | |
| SCHEMBL13197499 | 0.82 | CYP4F2 (0.31) | — | |
| SCHEMBL16852334 | 0.81 | — | — | |
| SCHEMBL10114855 | 0.79 | — | — | |
| SCHEMBL278638 | 0.79 | CYP4F2 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8940476-B2 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | FUJIFILM CORPORATION (JP) | 2015-01-27 | — | — | US | disclosed |
| US-20120264054-A1 | PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-10-18 | — | — | US | disclosed |