SCHEMBL1346335

SCHEMBL1346335

O=C(O)C1C=CC=CC1(C(=O)O)C(F)(C1(C(=O)O)C=CC=CC1C(=O)O)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7091706 0.83
SCHEMBL7790898 0.83
SCHEMBL10494807 0.75 PTPN1 (0.30)
SCHEMBL29195534 0.69
SCHEMBL3486070 0.67
SCHEMBL1142629 0.66
SCHEMBL28472610 0.65
SCHEMBL15090549 0.65
SCHEMBL1198132 0.64 POLB (0.30)
SCHEMBL5789431 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2204484-B1 POLYIMIDE FIBER MASS, SOUND ABSORBING MATERIAL, HEAT INSULATION MATERIAL, FLAME-RETARDANT MAT, FILTER CLOTH, HEAT-RESISTANT CLOTHING, NONWOVEN FABRIC, HEAT INSULATION/SOUND ABSORBING MATERIAL FOR AIRCRAFT, AND HEAT-RESISTANT BAG FILTER KANEKA CORP (JP) 2019-05-15 EP disclosed
US-9617669-B2 Method of making polyimide fiber assembly KANEKA CORPORATION (JP) 2017-04-11 US disclosed
US-8063245-B2 Phosphazene compound, photosensitive resin composition and use thereof KANEKA CORPORATION (JP) 2011-11-22 US disclosed
US-20100229517-A1 POLYIMIDE FIBER MASS, SOUND ABSORBING MATERIAL, THERMAL INSULATING MATERIAL, FLAME-RETARDANT MAT, FILTER CLOTH, HEAT RESISTANT CLOTHING, NONWOVEN FABRIC, HEAT INSULATION/SOUND ABSORBING MATERIAL FOR AIRCRAFT, AND HEAT RESISTANT BAG FILTER KANEKA CORPORATION (JP) 2010-09-16 US disclosed
US-20100218984-A1 PHOTOSENSITIVE DRY FILM RESIST, PRINTED WIRING BOARD MAKING USE OF THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD KANEKA CORPORATION (JP) 2010-09-02 US disclosed
EP-2204484-A1 POLYIMIDE FIBER MASS, SOUND ABSORBING MATERIAL, HEAT INSULATION MATERIAL, FLAME-RETARDANT MAT, FILTER CLOTH, HEAT-RESISTANT CLOTHING, NONWOVEN FABRIC, HEAT INSULATION/SOUND ABSORBING MATERIAL FOR AIRCRAFT, AND HEAT-RESISTANT BAG FILTER Kaneka Corporation (JP) 2010-07-07 EP disclosed
US-20060199920-A1 Photosensitive resin composition capable of being developed with aqueous developer and photosensitive dry film resist, and use thereof KANEKA CORPORATION (JP) 2006-09-07 US disclosed
US-20060142542-A1 Phosphazene compound, photosensitive resin composition and use thereof KANEKA CORPORATION (JP) 2006-06-29 US disclosed
US-6689899-B2 HYDROGENATION OF THE CORRESPONDING DINITRO COMPOUNDS KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2004-02-10 US disclosed
US-6642393-B2 Such as 2,5-(dihydroxybenzenecarboxylic octane)-dibenzoate-3,3',4,4' -tetracarboxylic acid anhydride for producing polyimides or polyamic acides having low water absorption; for use in cosmetics, aeronautics, and electronics KANEKA CORPORATION (JP) 2003-11-04 US disclosed
US-6605353-B2 Polyimide derived from a dianhydride and diamine having hydroxyl or carboxyl groups, which are modified with a diepoxide or unsaturated group-containing epoxide; curable; heat resistance, dielectric, film-forming KANEKA CORPORATION (JP) 2003-08-12 US disclosed
US-20020055610-A1 Novel polyimide compositions and novel acid dianhydrides to be used therein KANEKA CORPORATION (JP) 2002-05-09 US disclosed
US-6350845-B1 POLYAMIDEIMIDE COPOLYMERS FOR NONABSORBENT HEAT RESISTANT COMPOSITIONS KANEKA CORPORATION (JP) 2002-02-26 US disclosed
US-20020019558-A1 Diamine and acid anhydride KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2002-02-14 US disclosed
US-20010056174-A1 Epoxy-modified polyimide, photosensitive composition, coverlay film, solder resist, and printed wiring board using the epoxy-modified polyimide KANEKA CORPORATION (JP) 2001-12-27 US disclosed
US-6303742-B1 CHARACTERIZED BY A CINNAMOYL GROUP OR A DERIVED CINNAMOYL GROUP INCORPORATED THEREIN AND BY PHOTO-REACTIVITY AND HEAT-REACTIVITY WHICH ARE INHERENT IN THE CINNAMOYL GROUP. KANEKAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2001-10-16 US disclosed