Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.77 |
| ▸ | EYA2 | O00167 | 1/20 | 0.77 |
| ▸ | APP | P05067 | 1/20 | 0.77 |
| ▸ | ACE | P12821 | 1/20 | 0.77 |
| ▸ | PMP22 | Q01453 | 3/20 | 0.72 |
| ▸ | TSHR | P16473 | 3/20 | 0.72 |
| ▸ | LMNA | P02545 | 3/20 | 0.72 |
| ▸ | BLM | P54132 | 2/20 | 0.72 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.72 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.72 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.72 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.72 |
| ▸ | DRD1 | P21728 | 1/20 | 0.72 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.72 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.72 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.72 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.72 |
| ▸ | DRD3 | P35462 | 1/20 | 0.72 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.72 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.72 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11072519 | 0.97 | TDP1 (0.72) | TDP1EYA2APPACEPMP22 | |
| SCHEMBL3284547 | 0.97 | TDP1 (0.72) | TDP1EYA2APPACEPMP22 | |
| SCHEMBL311083 | 0.97 | TDP1 (0.72) | TDP1EYA2APPACEPMP22 | |
| SCHEMBL239081 | 0.97 | TDP1 (0.72) | TDP1EYA2APPACEPMP22 | |
| SCHEMBL9308060 | 0.97 | TDP1 (0.72) | TDP1EYA2APPACEPMP22 | |
| Water SCHEMBL8682763 | 0.94 | TDP1 (0.68) | TDP1EYA2APPACEPMP22 | |
| SCHEMBL7872108 | 0.94 | TDP1 (0.74) | TDP1EYA2APPACEPMP22 | |
| SCHEMBL133510 | 0.94 | TDP1 (0.77) | TDP1EYA2APPACEPMP22 | |
| SCHEMBL5495960 | 0.91 | TDP1 (0.72) | TDP1EYA2APPACEPMP22 | |
| Ammonia Solution, Strong SCHEMBL9133460 | 0.91 | TDP1 (0.72) | TDP1EYA2APPACEPMP22 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 775 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114450388-B | Composition for removing etching residues, and use method and application thereof | 弗萨姆材料美国有限责任公司 | 2025-03-21 | — | — | CN | claimed |
| US-12110436-B2 | Co/Cu selective wet etchant | VERSUM MATERIALS US, LLC (US) | 2024-10-08 | — | — | US | claimed |
| CN-115595154-B | SiGe and Si selective etching solution | 湖北兴福电子材料股份有限公司 | 2024-08-13 | — | — | CN | claimed |
| CN-118256249-A | Etching composition and application thereof | 宁波安集微电子科技有限公司 | 2024-06-28 | — | — | CN | claimed |
| EP-3540764-B1 | USE OF AN ETCHING SOLUTION FOR TUNGSTEN WORD LINE RECESS | VERSUM MAT US LLC (US) | 2024-05-22 | — | — | EP | claimed |
| CN-117887464-A | SiGe/Si and SiO 2 Is a selective etching solution | 湖北兴福电子材料股份有限公司 | 2024-04-16 | — | — | CN | claimed |
| CN-117866634-A | Silicon germanium etching solution with selectivity relative to silicon dioxide | 湖北兴福电子材料股份有限公司 | 2024-04-12 | — | — | CN | claimed |
| CN-117466271-A | Water controlled release process and method for preparing nano lithium iron phosphate by using same | 宜都兴发化工有限公司 | 2024-01-30 | — | — | CN | claimed |
| EP-3719105-B1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MAT USA INC (US) | 2023-09-27 | — | — | EP | claimed |
| CN-114258424-B | Etching composition | 富士胶片电子材料美国有限公司 | 2023-07-04 | — | — | CN | claimed |
| WO-2009032460-A1 | NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF RESIDUE FROM A MICROELECTRONIC DEVICE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-03-12 | — | — | WO | claimed |
| US-20080050513-A1 | PREVENTION OF QUANTUM DOT QUENCHING ON METAL SURFACES | CAMBRIOS TECHNOLOGIES CORPORATION (US) | 2008-02-28 | — | — | US | claimed |
| US-20070232513-A1 | Microelectronic Cleaning Compositions Containing Ammonia-Free Fluoride Salts for Selective Photoresist Stripping and Plasma Ash Residue Cleaning | MALLINCKRODT BAKER, INC (US) | 2007-10-04 | — | — | US | claimed |
| US-7247208-B2 | Microelectronic cleaning compositions containing ammonia-free fluoride salts | MALLINCKRODT BAKER, INC. (US) | 2007-07-24 | — | — | US | claimed |
| US-5972087-A | CONTAINING PIGMENT AND COLLOIDAL SILICA; USED TO RECORD WATER RESISTANT AND LIGHT RESISTANT PRINTS ON PLAIN PAPER | TOYO INK MANUFACTURING CO., LTD. (JP) | 1999-10-26 | — | — | US | claimed |
| US-5342450-A | Chelation | KAY CHEMICAL COMPANY (US) | 1994-08-30 | — | — | US | claimed |
| US-5080779-A | Mixing with water soluble chelate compound | BETZ LABORATORIES, INC. (US) | 1992-01-14 | — | — | US | claimed |
| US-5030658-A | For plant protection; sodium or potassium salts of oleic acid, linoleic acid and 12-20 carbon fatty acids; alkali metal or alkanolamine salt of carboxylic acids or alkylenepolyamine polyacidic acids as chelating agent | SAFER, INC. (US) | 1991-07-09 | — | — | US | claimed |
| US-4285575-A | USING AN ELECTROCHROMIC ELECTROLYTE CONTAINING A CARBOXYLIC-CONTAINING COMPLEXING AGENT, A FERROUS SALT, A METAL SALT, AND A CHROMOGEN; DURABILITY | CANON KABUSHIKI KAISHA (JP) | 1981-08-25 | — | — | US | claimed |
| US-4212518-A | ELECTROCHROMIC CELL | CANON KABUSHIKI KAISHA (JP) | 1980-07-15 | — | — | US | claimed |