⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13513585 | 0.89 | — | — | |
| SCHEMBL21032 | 0.84 | — | — | |
| SCHEMBL10011907 | 0.84 | — | — | |
| SCHEMBL27519257 | 0.84 | — | — | |
| SCHEMBL16754169 | 0.81 | — | — | |
| SCHEMBL249518 | 0.81 | — | — | |
| SCHEMBL966702 | 0.76 | — | — | |
| SCHEMBL3076054 | 0.76 | — | — | |
| Propene SCHEMBL28741675 | 0.74 | — | — | |
| SCHEMBL17212110 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7645557-B2 | Positive resist composition for immersion exposure and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2010-01-12 | — | — | US | disclosed |
| US-20070065753-A1 | Positive resist composition for immersion exposure and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-22 | — | — | US | disclosed |