SCHEMBL1353706

SCHEMBL1353706

C=C(CCC(O)CCC)C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 1/20 0.41
FFAR1 O14842 1/20 0.41
GPR84 Q9NQS5 5/20 0.39
TET2 Q6N021 4/20 0.39
TET3 O43151 1/20 0.39
TET1 Q8NFU7 1/20 0.39
CHRM1 P11229 1/20 0.38
AKR1A1 P14550 1/20 0.38
CHRM3 P20309 1/20 0.38
HTR2A P28223 1/20 0.38
HTR2C P28335 1/20 0.38
ADRA1A P35348 1/20 0.38
HRH1 P35367 1/20 0.38
DRD3 P35462 1/20 0.38
SLC6A3 Q01959 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC2 Q92769 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
NFKB1 P19838 1/20 0.36
FAAH O00519 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL613228 0.88 FFAR4 (0.52) FFAR4FFAR1GPR84NFKB1FAAH
SCHEMBL154215 0.85 TET2 (0.40) FFAR4FFAR1GPR84TET2TET3
SCHEMBL22115939 0.85 FFAR4 (0.58) FFAR4FFAR1GPR84NFKB1FAAH
SCHEMBL14245018 0.85 FFAR1 (0.62) FFAR4FFAR1GPR84NFKB1FAAH
SCHEMBL1627408 0.85 FFAR1 (0.62) FFAR4FFAR1GPR84NFKB1FAAH
SCHEMBL4420443 0.85 FFAR4 (0.58) FFAR4FFAR1GPR84NFKB1FAAH
SCHEMBL6063796 0.85 FFAR1 (0.62) FFAR4FFAR1GPR84NFKB1FAAH
SCHEMBL2589076 0.81 TET2 (0.40) FFAR4FFAR1TET2TET3TET1
SCHEMBL3517443 0.81 TET2 (0.50) FFAR4FFAR1GPR84TET2TET3
SCHEMBL15718200 0.81 HDAC1 (0.39) FFAR4TET2TET3TET1CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3127927-B1 HEAT RESISTANT SAN RESIN, PREPARATION METHOD THEREFOR, AND HEAT RESISTANT SAN RESIN COMPOSITION CONTAINING SAME LG CHEMICAL LTD (KR) 2020-06-24 EP claimed
EP-2084219-B1 POLYMERIC COUPLING AGENTS LUBRIZOL LTD (GB) 2012-09-05 EP claimed
US-20240010847-A1 COATING FILM FORMING COMPOSITION AND COATING FILM NITTO DENKO CORPORATION (JP) 2024-01-11 US disclosed
EP-4130170-A1 COMPOSITION FOR COATING-FILM FORMATION, AND COATING FILM NITTO DENKO CORPORATION (JP) 2023-02-08 EP disclosed
US-10093828-B2 Processing fluid for image forming by aqueous ink, image forming method, recorded matter, and inkjet recording device RICOH COMPANY, LTD. (JP) 2018-10-09 US disclosed
US-9955874-B2 Phantom CANON KABUSHIKI KAISHA (JP) 2018-05-01 US disclosed
US-20160312061-A1 PROCESSING FLUID FOR IMAGE FORMING BY AQUEOUS INK, IMAGE FORMING METHOD, RECORDED MATTER, AND INKJET RECORDING DEVICE RICOH COMPANY, LTD. (JP) 2016-10-27 US disclosed
US-9428605-B2 Organic-inorganic hybrid material compositions and polymer composites NEO SITECH LLC (US) 2016-08-30 US disclosed
US-9340718-B2 Laminate and method of producing laminate NITTO DENKO CORPORATION (JP) 2016-05-17 US disclosed
US-20160120412-A1 PHANTOM CANON KABUSHIKI KAISHA (JP) 2016-05-05 US disclosed
US-20160125766-A1 PHOTOACOUSTIC BLOOD MODEL CANON KABUSHIKI KAISHA (JP) 2016-05-05 US disclosed
US-20100039685-A1 VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR FORMING VOLUME HOLOGRAM RECORDING LAYER, VOLUME HOLOGRAM RECORDING MATERIAL, AND VOLUME HOLOGRAM OPTICAL RECORDING METHOD MITSUBISHI CHEMICAL CORPORATION (JP) 2010-02-18 US disclosed
US-20080182135-A1 MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2008-07-31 US disclosed
US-20060063857-A1 Ink composition for inkjet recording and inkjet recording method FUJI PHOTO FILM CO., LTD. 2006-03-23 US disclosed
US-5677385-A ACRYLIC OR METHACRYLIC POLYMER COMPRISING A MODIFIED ALICYCLIC EPOXY GROUP; PHOTOSENSITIVITY, HYDROLYSIS RESISTANCE, TACKINESS, STABILITY, DEVELOPABILITY DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1997-10-14 US disclosed
US-5650233-A Photo-setting colored filter composition, a color filter, a process for the preparation thereof, and a curable resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1997-07-22 US disclosed
EP-0736555-A2 Radiation-curable epoxy resin composition U C B, S.A. (BE) 1996-10-09 EP disclosed
EP-0726279-A2 A photo-setting colored filter compositions, a color filter, a process for the preparation thereof, and a curable resin composition DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1996-08-14 EP disclosed
US-5534322-A OPTICAL AND MAGNETIC DISKS WITH ANTISTATIC OVERCOATING, QUATERNIZED ADDITION POLYMER KAO CORPORATION (JP) 1996-07-09 US disclosed
US-4587201-A Photo-curable urethane-acrylate resin composition for permanent resist NIPPON SODA CO. LTD. (JP) 1986-05-06 US disclosed