⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13554276 | 0.81 | — | — | |
| SCHEMBL13554272 | 0.76 | — | — | |
| SCHEMBL19124515 | 0.76 | — | — | |
| SCHEMBL16372965 | 0.72 | — | — | |
| SCHEMBL13554278 | 0.72 | — | — | |
| SCHEMBL26362987 | 0.72 | HTT (0.36) | — | |
| SCHEMBL13554271 | 0.72 | CYP17A1 (0.35) | — | |
| SCHEMBL25714175 | 0.71 | — | — | |
| SCHEMBL16372643 | 0.71 | — | — | |
| SCHEMBL14770388 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9005874-B2 | Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-14 | — | — | US | disclosed |
| US-20120270155-A1 | COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-25 | — | — | US | disclosed |