⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3621708 | 0.91 | — | — | |
| SCHEMBL183066 | 0.88 | — | — | |
| SCHEMBL12458700 | 0.88 | — | — | |
| SCHEMBL6034379 | 0.88 | — | — | |
| SCHEMBL646411 | 0.87 | — | — | |
| SCHEMBL125173 | 0.87 | — | — | |
| SCHEMBL704022 | 0.87 | — | — | |
| SCHEMBL13089439 | 0.86 | — | — | |
| SCHEMBL4425993 | 0.86 | — | — | |
| SCHEMBL3235545 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 640 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260117376-A1 | METHOD AND SYSTEM FOR FORMING A SILICON-CONTAINING LAYER AND STRUCTURE FORMED USING SAME | ASM IP HOLDING BV (NL) | 2026-04-30 | — | — | US | claimed |
| US-20250320601-A1 | METHOD AND SYSTEM FOR FORMING A SILICON OXYCARBIDE LAYER AND STRUCTURE FORMED USING SAME | ASM IP HOLDING BV (NL) | 2025-10-16 | — | — | US | claimed |
| US-20250304819-A1 | Flexible and foldable abrasion resistant photopatternable siloxane hard coat | OPTITUNE OY (FI) | 2025-10-02 | — | — | US | claimed |
| US-20250253145-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING B.V. (NL) | 2025-08-07 | — | — | US | claimed |
| US-12359312-B2 | Method and system for forming a silicon oxycarbide layer and structure formed using same | ASM IP HOLDING B.V. (NL) | 2025-07-15 | — | — | US | claimed |
| CN-120192741-A | Equal-proportion semitransparent bi-component dealcoholized organosilicon sealant for electric kettle and preparation method and application thereof | 广东皓明有机硅材料有限公司 | 2025-06-24 | — | — | CN | claimed |
| WO-2025078379-A1 | EASY TO CLEAN COATINGS WITH LOW FINGERPRINT VISIBILITY | OPTITUNE OY (FI) | 2025-04-17 | — | — | WO | claimed |
| EP-2262576-B1 | COMPOSITE MATERIALS CONTAINING NANOPARTICLES AND THEIR USE IN CHROMATOGRAPHY | WATERS TECHNOLOGIES CORP (US) | 2025-03-12 | — | — | EP | claimed |
| US-12145937-B2 | Process for preparing bicyclic guanidines | WACKER CHEMIE AG (DE) | 2024-11-19 | — | — | US | claimed |
| US-20240361695-A1 | STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-OXIDE RESIST AND METHODS OF FORMING SAME | ASM IP HOLDING B.V. (NL) | 2024-10-31 | — | — | US | claimed |
| US-8026035-B2 | Organosilicon polymer containing chromogen; antireflactivity coating for lithography | CHEIL INDUSTRIES, INC. (KR) | 2011-09-27 | — | — | US | claimed |
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | claimed |
| US-20110049056-A1 | COMPOSITE MATERIALS CONTAINING NANOPARTICLES AND THEIR USE IN CHROMATOGRAPHY | WATERS TECHNOLOGIES CORPORATION (US) | 2011-03-03 | — | — | US | claimed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | claimed |
| EP-2262576-A1 | COMPOSITE MATERIALS CONTAINING NANOPARTICLES AND THEIR USE IN CHROMATOGRAPHY | Waters Technologies Corporation (US) | 2010-12-22 | — | — | EP | claimed |
| WO-2009126207-A1 | COMPOSITE MATERIALS CONTAINING NANOPARTICLES AND THEIR USE IN CHROMATOGRAPHY | WATERS TECHNOLOGIES CORPORATION (US) | 2009-10-15 | — | — | WO | claimed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | claimed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | claimed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | claimed |
| US-6409874-B1 | ORGANOFUNCTIONAL VINYLTRIALKOXYSILANE AND A NONORGANOFUNCTIONAL ALKOXYLATED SUBSTITUTED ALKYL SILANE; RESISTANT TO FUELS, OIL AND ORGANIC SOLVENTS; FLUOROSILICONE RUBBERS | VERNAY LABORATORIES, INC. | 2002-06-25 | — | — | US | claimed |