SCHEMBL1355822

SCHEMBL1355822

C=CC(F)OC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL278123 0.75
SCHEMBL2260752 0.69
SCHEMBL465415 0.67
SCHEMBL95833 0.67
SCHEMBL370740 0.67
Tetrafluoroethylene SCHEMBL8922759 0.67
SCHEMBL1939008 0.65
Ethylene SCHEMBL20139205 0.65
SCHEMBL5044080 0.65
SCHEMBL3115191 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114243011-B Piezoelectric material for battery cathode and preparation method thereof 华为技术有限公司 2024-03-26 CN claimed
CN-110024198-B Nonaqueous electrolyte secondary battery 松下电器产业株式会社 2022-05-03 CN claimed
CN-114243011-A Piezoelectric material for battery cathode and preparation method thereof 华为技术有限公司 2022-03-25 CN claimed
US-20190312262-A1 NONAQUEOUS ELECTROLYTE SECONDARY BATTERY PANASONIC CORPORATION (JP) 2019-10-10 US claimed
EP-0294976-B1 Non-hydrous soft contact lens and process for producing the same JAPAN SYNTHETIC RUBBER CO LTD (JP) 1994-01-05 EP claimed
US-4882403-A Non-hydrous soft contact lens and process for producing the same JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1989-11-21 US claimed
EP-0294976-A2 Non-hydrous soft contact lens and process for producing the same CIBA-GEIGY AG (CH) 1988-12-14 EP claimed
US-4582924-A REACXTING FLUOROALKYL SILYL KETENE ACETAL WITH KETONE, ACETAL OR ACYL HALIDE DAIKIN KOGYO CO., LTD. (JP) 1986-04-15 US claimed
JP-1203481-A None JP disclosed
CN-117839447-A Porous film 东京应化工业株式会社 2024-04-09 CN disclosed
CN-114243011-B Piezoelectric material for battery cathode and preparation method thereof 华为技术有限公司 2024-03-26 CN disclosed
CN-117202984-A Polyimide porous film 东京应化工业株式会社 2023-12-08 CN disclosed
CN-109565082-B Nonaqueous electrolyte and nonaqueous electrolyte secondary battery 松下控股株式会社 2022-09-27 CN disclosed
CN-109997271-B Nonaqueous electrolyte secondary battery 松下知识产权经营株式会社 2022-09-02 CN disclosed
CN-1645220-A Radiation sensitive resin composition for forming partition, its forming method and liquid crystal display device JSR CO LTD (JP) 2005-07-27 CN disclosed
EP-0294976-B1 Non-hydrous soft contact lens and process for producing the same JAPAN SYNTHETIC RUBBER CO LTD (JP) 1994-01-05 EP disclosed
US-4882403-A Non-hydrous soft contact lens and process for producing the same JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1989-11-21 US disclosed
JP-H01203481-A RESIN COMPOSITION FOR ELECTRO-DEPOSITION COATING HONNY CHEM IND CO LTD 1989-08-16 JP disclosed
EP-0294976-A2 Non-hydrous soft contact lens and process for producing the same CIBA-GEIGY AG (CH) 1988-12-14 EP disclosed
EP-0120368-B1 ALPHA-FLUOROALKYL CARBOXYLIC ACID ESTERS AND PROCESS FOR PREPARING THE SAME Daikin Kogyo Co., Ltd. (JP) 1988-07-20 EP disclosed