SCHEMBL1357293

SCHEMBL1357293

C=CC(=O)OCC1(CC)CCO1

nearest known ligand 0.42

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.42
HPGD P15428 1/20 0.42
ALDH1A1 P00352 4/20 0.37
TP53 P04637 3/20 0.37
HIF1A Q16665 3/20 0.37
CYP3A4 P08684 2/20 0.37
HSD17B10 Q99714 1/20 0.37
THRB P10828 1/20 0.36
MAPK1 P28482 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
PRKCA P17252 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2884001 0.89 TSHR (0.39) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL238971 0.88 TSHR (0.43) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL27881843 0.86 TSHR (0.51) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL1356956 0.85 TSHR (0.46) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL27881845 0.84 TSHR (0.49) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28032130 0.83 GSTP1 (0.33)
SCHEMBL13771703 0.83 TSHR (0.37) TSHRHPGDALDH1A1TP53HIF1A
Ether SCHEMBL238970 0.82 TSHR (0.39) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL1356974 0.81 TSHR (0.40) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL4919503 0.80 TSHR (0.37) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8298743-B2 Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery FUJIFILM CORPORATION (JP) 2012-10-30 US claimed
US-20100266956-A1 POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, TRANSPARENT CONDUCTIVE FILM, DISPLAY ELEMENT AND INTEGRATED SOLAR BATTERY FUJIFILM CORPORATION (JP) 2010-10-21 US claimed
US-7670745-B2 Alkali soluble polymer and positive working photosensitive resin composition using the same CHISSO CORPORATION (JP) 2010-03-02 US claimed
US-20080131813-A1 Alkali soluble polymer and positive working photosensitive resin composition using the same CHISSO CORPORATION 2008-06-05 US claimed
CN-102859439-B Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof JSR株式会社 2017-06-30 CN disclosed
CN-105408427-A Compound and colored curable resin composition DONGWOO FINE CHEM CO LTD 2016-03-16 CN disclosed
CN-102838578-B Salt and cured composition for color SUMITOMO CHEMICAL CO.,LTD. (JP) 2016-03-16 CN disclosed
CN-102870047-B Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof JSR CORP. (JP) 2016-03-02 CN disclosed
CN-105263968-A Colored curable resin composition DONGWOO FINE CHEM CO LTD 2016-01-20 CN disclosed
CN-105198805-A Compound and coloring curable resin composition SUMITOMO CHEMICAL CO 2015-12-30 CN disclosed
CN-102344691-B Dye well coloured composition SUMITOMO CHEMICAL CO.,LTD. (JP) 2015-11-25 CN disclosed
CN-102372825-B Curable resin composition SUMITOMO CHEMICAL CO., LTD. (JP) 2015-11-04 CN disclosed
CN-102336873-B Curable resin composition SUMITOMO CHEMICAL CO 2015-03-11 CN disclosed
CN-104379628-A Sulfonium compounds, their preparation and use BASF SE 2015-02-25 CN disclosed
US-8298743-B2 Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery FUJIFILM CORPORATION (JP) 2012-10-30 US disclosed
US-20110281040-A1 LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF JSR CORPORATION (JP) 2011-11-17 US disclosed
US-20100266956-A1 POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, TRANSPARENT CONDUCTIVE FILM, DISPLAY ELEMENT AND INTEGRATED SOLAR BATTERY FUJIFILM CORPORATION (JP) 2010-10-21 US disclosed
US-20100133728-A1 CURABLE COMPOSITION FOR PHOTOIMPRINT, AND METHOD FOR PRODUCING CURED PRODUCT USING SAME FUJIFILM CORPORATION (JP) 2010-06-03 US disclosed
US-7670745-B2 Alkali soluble polymer and positive working photosensitive resin composition using the same CHISSO CORPORATION (JP) 2010-03-02 US disclosed
US-20080131813-A1 Alkali soluble polymer and positive working photosensitive resin composition using the same CHISSO CORPORATION 2008-06-05 US disclosed