⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17646124 | 0.87 | — | — | |
| SCHEMBL1358616 | 0.81 | KDM4E (0.34) | — | |
| SCHEMBL14433080 | 0.79 | TSHR (0.34) | — | |
| SCHEMBL9001859 | 0.77 | TSHR (0.37) | — | |
| SCHEMBL15402639 | 0.75 | — | — | |
| SCHEMBL15403495 | 0.75 | — | — | |
| SCHEMBL13555425 | 0.75 | — | — | |
| SCHEMBL15403267 | 0.75 | — | — | |
| SCHEMBL1358124 | 0.75 | — | — | |
| SCHEMBL15403028 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | claimed |
| US-20220310407-A1 | ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | Wonik Materials (KR) | 2022-09-29 | — | — | US | claimed |
| US-5346645-A | Desiccant composition and a method of desiccating articles | DAIKIN INDUSTRIES, LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| JP-5214373-A | — | — | None | — | — | JP | disclosed |
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | disclosed |
| US-20240234031-A1 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR APPARATUS AND ELECTRONIC APPARATUS INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-11 | — | — | US | disclosed |
| US-11859312-B2 | Method of cleaning a group III-nitride single crystal substrate comprising cleaning a nitrogen-polar face with a detergent including a fluoroorganic compound | TOKUYAMA CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230313413-A1 | METHOD OF CLEANING GROUP III NITRIDE SINGLE CRYSTAL SUBSTRATE, AND METHOD OF PRODUCING THE SAME | TOKUYAMA CORPORATION (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20220310407-A1 | ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | Wonik Materials (KR) | 2022-09-29 | — | — | US | disclosed |
| US-20170032813-A1 | IONIC PERFLUOROPOLYETHER LUBRICANT | FUJI ELECTRIC (MALAYSIA) SDN, BHD. (MY) | 2017-02-02 | — | — | US | disclosed |
| EP-2684870-A1 | METHOD FOR PREPARING THIOCARBOXYLIC ACID S-(FLUOROALKYL) ESTER | Sumitomo Chemical Company Limited (JP) | 2014-01-15 | — | — | EP | disclosed |
| EP-1288284-B1 | CLEANING AGENT, CLEANING METHOD AND CLEANING APPARATUS | ASAHI CHEMICAL IND (JP) | 2008-10-29 | — | — | EP | disclosed |
| US-20060249179-A1 | Process for removing water and apparatus for removing water | ASAHI GLASS COMPANY, LIMITED (JP) | 2006-11-09 | — | — | US | disclosed |
| EP-1719550-A1 | METHOD OF DEWATERING AND DEWATERING APPARATUS | Asahi Glass Company, Limited (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20030168079-A1 | Cleaning agent, cleaning method and cleaning apparatus | TOKUYAMA METEL CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1288284-A1 | CLEANING AGENT, CLEANING METHOD AND CLEANING APPARATUS | Asahi Kasei Kabushiki Kaisha (JP) | 2003-03-05 | — | — | EP | disclosed |
| EP-0516029-B1 | A method of desiccating articles | DAIKIN IND LTD (JP) | 1995-04-05 | — | — | EP | disclosed |
| US-5346645-A | Desiccant composition and a method of desiccating articles | DAIKIN INDUSTRIES, LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| JP-H05214373-A | 1H,1H,4H-PERFLUOROBUTANE-BASED CLEANING SOLVENT | ASAHI CHEM IND CO LTD | 1993-08-24 | — | — | JP | disclosed |
| EP-0516029-A1 | A method of desiccating articles | DAIKIN INDUSTRIES, LIMITED (JP) | 1992-12-02 | — | — | EP | disclosed |