⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13608909 | 0.83 | — | — | |
| SCHEMBL2681326 | 0.83 | — | — | |
| SCHEMBL2682160 | 0.79 | — | — | |
| SCHEMBL13319476 | 0.79 | — | — | |
| SCHEMBL13608900 | 0.79 | F10 (0.34) | — | |
| SCHEMBL3410272 | 0.77 | — | — | |
| SCHEMBL2680957 | 0.76 | — | — | |
| SCHEMBL13608899 | 0.76 | EPHX2 (0.30) | — | |
| SCHEMBL13319473 | 0.76 | NPSR1 (0.30) | — | |
| SCHEMBL13608980 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7622242-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-24 | — | — | US | disclosed |
| US-20090081588-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |