SCHEMBL13609127

SCHEMBL13609127

CCCCCCCCCCCCCCCCCc1ccc(O)cc1O

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TYR P14679 7/20 1.00
CYP3A4 P08684 3/20 1.00
MAPT P10636 2/20 1.00
TP53 P04637 2/20 1.00
MEN1 O00255 1/20 1.00
ALOX5 P09917 1/20 1.00
ALOX15 P16050 1/20 1.00
TSHR P16473 1/20 1.00
HTT P42858 1/20 1.00
KMT2A Q03164 1/20 1.00
TDP1 Q9NUW8 1/20 1.00
KDM4E B2RXH2 2/20 0.63
ALDH1A1 P00352 2/20 0.63
HSD17B10 Q99714 2/20 0.63
USP2 O75604 1/20 0.63
GLA P06280 1/20 0.63
GAA P10253 1/20 0.63
HPGD P15428 1/20 0.63
CASP1 P29466 1/20 0.63
CASP7 P55210 1/20 0.63

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30911960 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
SCHEMBL31377626 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
SCHEMBL69504 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
SCHEMBL5675182 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
SCHEMBL1123553 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
SCHEMBL13609128 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
Hexylresorcinol SCHEMBL29107 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
SCHEMBL70910 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
SCHEMBL6334759 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1
Hexylresorcinol SCHEMBL29373062 1.00 TYR (1.00) TYRCYP3A4MAPTTP53MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140272692-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN FUJIFILM CORPORATION (JP) 2014-09-18 US disclosed
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-7615330-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-11-10 US disclosed
US-20070224540-A1 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-09-27 US disclosed