SCHEMBL1361209

SCHEMBL1361209

CC(C(=O)O)(c1ccc(Oc2ccc(C(=O)O)c(C(=O)O)c2)cc1)c1ccc(Oc2ccc(C(=O)O)c(C(=O)O)c2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 4/20 0.55
ALDH1A1 P00352 1/20 0.50
HPSE Q9Y251 1/20 0.48
TDP1 Q9NUW8 5/20 0.47
DUSP3 P51452 1/20 0.47
PTPN5 P54829 1/20 0.47
PTPN11 Q06124 1/20 0.47
NPC1 O15118 1/20 0.45
CYP2C9 P11712 1/20 0.45
RAB9A P51151 1/20 0.45
L3MBTL1 Q9Y468 2/20 0.44
APEX1 P27695 1/20 0.44
CTDSP1 Q9GZU7 1/20 0.44
XDH P47989 1/20 0.44
LMNA P02545 1/20 0.44
GALK1 P51570 1/20 0.43
CASP6 P55212 1/20 0.43
MCL1 Q07820 1/20 0.43
PLEC Q15149 1/20 0.43
PYGL P06737 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2488169 0.88 POLB (0.52) POLBALDH1A1HPSETDP1DUSP3
SCHEMBL28852244 0.88 POLB (0.52) POLBALDH1A1HPSETDP1DUSP3
SCHEMBL29958625 0.88 POLB (0.52) POLBALDH1A1HPSETDP1DUSP3
SCHEMBL29363335 0.88 POLB (0.52) POLBALDH1A1HPSETDP1DUSP3
SCHEMBL2270802 0.87 POLB (0.58) POLBALDH1A1HPSETDP1DUSP3
SCHEMBL29401261 0.87 POLB (0.58) POLBALDH1A1HPSETDP1DUSP3
SCHEMBL260857 0.87 POLB (0.58) POLBALDH1A1HPSETDP1DUSP3
SCHEMBL21437005 0.86 POLB (0.56) POLBALDH1A1HPSETDP1DUSP3
SCHEMBL21437004 0.86 POLB (0.56) POLBALDH1A1HPSETDP1DUSP3
Water SCHEMBL3777569 0.86 POLB (0.56) POLBALDH1A1HPSETDP1DUSP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117500895-A Adhesive composition, adhesive sheet, electromagnetic wave shielding material, laminate, and printed wiring board 东洋纺MC株式会社 2024-02-02 CN disclosed
CN-113286835-B Adhesive composition containing dimeric alcohol copolymerized polyimide polyurethane resin 东洋纺MC株式会社 2023-09-29 CN disclosed
WO-2020158360-A1 ADHESIVE COMPOSITION CONTAINING A DIMER DIOL COPOLYMER POLYIMIDE URETHANE RESIN 東洋紡株式会社 2020-08-06 WO disclosed
CN-106661198-B Resin combination, prepreg, the metal foil of resin, metal-clad, printed wiring board 松下知识产权经营株式会社 2019-08-06 CN disclosed
US-9604391-B2 Laminate, production method for same, and method of creating device structure using laminate TOYOBO CO., LTD. (JP) 2017-03-28 US disclosed
US-8980409-B2 Laminate, method for producing same, and method for producing device structure using same TOYOBO CO., LTD. (JP) 2015-03-17 US disclosed
US-8889250-B2 Plating target material, polyamic solution and polyimide resin solution which are used to form the plating target material, and printed-wiring board using them KANEKA CORPORATION (JP) 2014-11-18 US disclosed
US-20140042662-A1 LAMINATE, PRODUCTION METHOD FOR SAME, AND METHOD OF CREATING DEVICE STRUCTURE USING LAMINATE TOYOBO CO., LTD. (JP) 2014-02-13 US disclosed
US-20140041800-A1 LAMINATE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING DEVICE STRUCTURE USING SAME TOYOBO CO., LTD. (JP) 2014-02-13 US disclosed
US-8501874-B2 Thermosetting resin composition, multilayer body using same, and circuit board KANEKA CORPORATION (JP) 2013-08-06 US disclosed
US-20070074896-A1 Thermosetting resin composition, laminated body using it, and circuit board KANEKA CORPORATION (JP) 2007-04-05 US disclosed
US-20060205891-A1 Thermosetting resin composition, multilayer body using same, and circuit board KANEKA CORPORATION (JP) 2006-09-14 US disclosed
EP-0957400-B1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN THEREFROM, ELECTRONIC DEVICES PRODUCED BY USING THE SAME, AND METHOD FOR PRODUCTION THEREOF HITACHI CHEMICAL CO LTD (JP) 2003-04-16 EP disclosed
US-6291619-B1 HEAT RESISTANCE HITACHI CHEMICAL CO., LTD (JP) 2001-09-18 US disclosed
EP-0957400-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN THEREFROM, ELECTRONIC DEVICES PRODUCED BY USING THE SAME, AND METHOD FOR PRODUCTION THEREOF HITACHI CHEMICAL CO., LTD. (JP) 1999-11-17 EP disclosed
EP-0499986-B1 Multilayer wiring structure and method for forming multilayer construction HITACHI LTD (JP) 1998-05-13 EP disclosed
US-5616448-A Photosensitive resin composition and a process for forming a patterned polyimide film using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-04-01 US disclosed
US-5587275-A POLYAMIC ACIDS COMPRISING DIAMINES WITH AN ACRYLOXY OR A METHACRYLOXY GROUP; STORAGE STABILITY SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-12-24 US disclosed
US-5570506-A POLYIMIDE WITH LOW THERMAL EXPANSION HITACHI, LTD. (JP) 1996-11-05 US disclosed
EP-0499986-A2 Multilayer wiring structure and method for forming multilayer construction HITACHI, LTD. (JP) 1992-08-26 EP disclosed