SCHEMBL1361919

SCHEMBL1361919

CCCC(=O)CC(=O)[O-].CCCC(=O)CC(=O)[O-].CCO[Al+2]

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 4/20 0.48
HDAC1 Q13547 4/20 0.48
HDAC2 Q92769 4/20 0.48
HDAC8 Q9BY41 4/20 0.48
FFAR3 O14843 3/20 0.48
CES2 O00748 1/20 0.40
CES1 P23141 1/20 0.40
CA1 P00915 1/20 0.38
CA4 P22748 2/20 0.38
ALDH1A1 P00352 1/20 0.36
HAO1 Q9UJM8 1/20 0.35
HDAC6 Q9UBN7 1/20 0.34
CTSD P07339 1/20 0.33
BBOX1 O75936 1/20 0.32
KDM4E B2RXH2 1/20 0.32
KDM6B O15054 1/20 0.32
KDM5C P41229 1/20 0.32
EGLN1 Q9GZT9 1/20 0.32
PHF8 Q9UPP1 1/20 0.32
KDM2A Q9Y2K7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1360832 0.89 HDAC3 (0.50) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL22685702 0.88 HDAC3 (0.44) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219170 0.86 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219168 0.86 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL49244 0.86 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219180 0.86 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219174 0.86 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21236946 0.86 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219172 0.86 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3
SCHEMBL21219182 0.86 HDAC3 (0.57) HDAC3HDAC1HDAC2HDAC8FFAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117776546-A Anti-reflection glass 福美化学工业株式会社 2024-03-29 CN disclosed
CN-117425632-A Anti-reflection glass 福美化学工业株式会社 2024-01-19 CN disclosed
US-11773287-B2 Method for forming coating TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-03 US disclosed
EP-3514822-B1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES (JP) 2023-04-26 EP disclosed
US-11094899-B2 Method for manufacturing field effect transistor and method for manufacturing wireless communication device TORAY INDUSTRIES, INC. 2021-08-17 US disclosed
EP-3367402-B1 CAPACITOR, METHOD FOR MANUFACTURING SAME, AND WIRELESS COMMUNICATION DEVICE USING SAME TORAY INDUSTRIES (JP) 2021-07-07 EP disclosed
US-20200369914-A1 METHOD FOR FORMING COATING TOKYO OHKA KOGYO CO., LTD. (JP) 2020-11-26 US disclosed
US-10636866-B2 Capacitor, method for manufacturing same, and wireless communication device using same TORAY INDUSTRIES, INC. (JP) 2020-04-28 US disclosed
US-10490748-B2 Rectifying element, method for producing same, and wireless communication device TORAY INDUSTRIES, INC. (JP) 2019-11-26 US disclosed
EP-3514822-A1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE Toray Industries, Inc. (JP) 2019-07-24 EP disclosed
US-20180026197-A1 RECTIFYING ELEMENT, METHOD FOR PRODUCING SAME, AND WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES, INC. (JP) 2018-01-25 US disclosed
US-20160035457-A1 FIELD EFFECT TRANSISTOR TORAY INDUSTRIES, INC. (JP) 2016-02-04 US disclosed
EP-2975649-A1 FIELD EFFECT TRANSISTOR Toray Industries, Inc. (JP) 2016-01-20 EP disclosed
US-8563675-B2 Curable compositions composed of silanes with two hydrolyzable groups HENKEL AG & CO. KGAA (DE) 2013-10-22 US disclosed
US-8450411-B2 Curable composition having a silane-modified reactive thinner HENKEL AG & CO. KGAA (DE) 2013-05-28 US disclosed
US-20120108730-A1 CURABLE COMPOSITION HAVING A SILANE-MODIFIED REACTIVE THINNER HENKEL AG & CO. KGAA (DE) 2012-05-03 US disclosed
US-8067508-B2 Compositions consisting of partially silyl-terminated polymers HENKEL AG & CO. KGAA (DE) 2011-11-29 US disclosed
US-20100204387-A1 CURABLE COMPOSITIONS COMPOSED OF SILANES WITH TWO HYDROLYZABLE GROUPS HENKEL AG & CO. KGAA (DE) 2010-08-12 US disclosed
US-20100143712-A1 SILANE-CROSSLINKING ADHESIVE OR SEALANT COMPRISING N-SILYLALKYLAMIDES AND USE THEREOF HENKEL AG & CO. KGAA (DE) 2010-06-10 US disclosed
US-20100081757-A1 COMPOSITIONS CONSISTING OF PARTIALLY SILYL-TERMINATED POLYMERS HENKEL AG & CO. KGAA (DE) 2010-04-01 US disclosed