SCHEMBL1362592

SCHEMBL1362592

C1CNC(CCC2=NCCN2)=N1

nearest known ligand 0.65

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
NISCH Q9Y2I1 3/20 0.65
MAOA P21397 2/20 0.65
MAOB P27338 2/20 0.65
TAAR1 Q96RJ0 4/20 0.54
LMNA P02545 1/20 0.50
CYP1A2 P05177 1/20 0.50
ADRA2A P08913 1/20 0.50
CYP2D6 P10635 1/20 0.50
TSHR P16473 1/20 0.50
ADRA2B P18089 1/20 0.50
ADRA2C P18825 1/20 0.50
ADRA1D P25100 1/20 0.50
ADRA1A P35348 1/20 0.50
ADRA1B P35368 1/20 0.50
HTR1D P28221 5/20 0.48
HTR1B P28222 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9575282 0.89 NISCH (0.55) NISCHMAOAMAOBTAAR1LMNA
SCHEMBL9575185 0.89 NISCH (0.55) NISCHMAOAMAOBTAAR1LMNA
SCHEMBL11132101 0.87 NISCH (0.53) NISCHMAOAMAOBTAAR1LMNA
Hydrochloric Acid SCHEMBL2419368 0.87 NISCH (0.53) NISCHMAOAMAOBTAAR1LMNA
SCHEMBL9575191 0.87 NISCH (0.53) NISCHMAOAMAOBTAAR1LMNA
SCHEMBL989780 0.87 NISCH (0.53) NISCHMAOAMAOBTAAR1LMNA
SCHEMBL11128132 0.87 NISCH (0.53) NISCHMAOAMAOBTAAR1LMNA
SCHEMBL11131504 0.87 NISCH (0.53) NISCHMAOAMAOBTAAR1LMNA
SCHEMBL11132599 0.87 NISCH (0.53) NISCHMAOAMAOBTAAR1LMNA
SCHEMBL9575633 0.87 NISCH (0.53) NISCHMAOAMAOBTAAR1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2480495-B1 PROCESS AND REAGENTS FOR THE INHIBITION OR REDUCTION OF SCALE FORMATION DURING PHOSPHORIC ACID PRODUCTION CYTEC TECH CORPORATION (US) 2018-11-14 EP claimed
EP-2101920-B1 PROCESS FOR THE REMOVAL OF IMPURITIES FROM CARBONATE MINERALS CYTEC TECH CORP (US) 2017-02-22 EP claimed
US-9242863-B2 Process and reagents for the inhibition or reduction of scale formation during phosphoric acid production CYTEC TECHNOLOGY CORP. (US) 2016-01-26 US claimed
EP-2480495-A1 PROCESS AND REAGENTS FOR THE INHIBITION OR REDUCTION OF SCALE FORMATION DURING PHOSPHORIC ACID PRODUCTION Cytec Technology Corporation (US) 2012-08-01 EP claimed
US-8066885-B2 Process for the removal of impurities from carbonate minerals CYTEC TECHNOLOGY CORP. (US) 2011-11-29 US claimed
US-20110076218-A1 Process and Reagents for the Inhibition or Reduction of Scale Formation During Phosphoric Acid Production CYTEC TECHNOLOGY CORP. (US) 2011-03-31 US claimed
WO-2011038108-A1 PROCESS AND REAGENTS FOR THE INHIBITION OR REDUCTION OF SCALE FORMATION DURING PHOSPHORIC ACID PRODUCTION CYTEC TECHNOLOGY CORP. (US) 2011-03-31 WO claimed
US-20080164140-A1 PROCESS FOR THE REMOVAL OF IMPURITIES FROM CARBONATE MINERALS CYTEC TECHNOLOGY CORP. 2008-07-10 US claimed
EP-2480495-B1 PROCESS AND REAGENTS FOR THE INHIBITION OR REDUCTION OF SCALE FORMATION DURING PHOSPHORIC ACID PRODUCTION CYTEC TECH CORPORATION (US) 2018-11-14 EP disclosed
EP-2101920-B1 PROCESS FOR THE REMOVAL OF IMPURITIES FROM CARBONATE MINERALS CYTEC TECH CORP (US) 2017-02-22 EP disclosed
US-20160332916-A1 BENEFICIATING PROCESS IMERYS CERAMICS FRANCE (FR) 2016-11-17 US disclosed
EP-2990379-A1 PROCESS AND REAGENTS FOR THE INHIBITION OR REDUCTION OF SCALE FORMATION DURING PHOSPHORIC ACID PRODUCTION Cytec Technology Corp. (US) 2016-03-02 EP disclosed
US-9242863-B2 Process and reagents for the inhibition or reduction of scale formation during phosphoric acid production CYTEC TECHNOLOGY CORP. (US) 2016-01-26 US disclosed
EP-2480495-A1 PROCESS AND REAGENTS FOR THE INHIBITION OR REDUCTION OF SCALE FORMATION DURING PHOSPHORIC ACID PRODUCTION Cytec Technology Corporation (US) 2012-08-01 EP disclosed
EP-0730616-B1 PROCESS FOR PREPARING POLYAZAMACROCYCLES DOW GLOBAL TECHNOLOGIES INC (US) 2003-02-05 EP disclosed
US-5587451-A Process for preparing polyazamacrocycles THE DOW CHEMICAL COMPANY (US) 1996-12-24 US disclosed
EP-0331507-B1 POLYVINYL CHLORIDE PLASTISOL COMPOSITION ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 1993-05-19 EP disclosed
US-4977201-A Blended with modified epoxy resin, blocked isocyanate, latent curing for resin as tackifier, automobile undercoatings ASAHI DENKA KOGYO K.K. (JP) 1990-12-11 US disclosed
EP-0331507-A1 Polyvinyl chloride plastisol composition ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 1989-09-06 EP disclosed
US-4423204-A HEAT RESISTANCE MOLDING MATERIALS THE UPJOHN COMPANY (US) 1983-12-27 US disclosed